| Citation: | SANG Xi-en, WANG Fang, LIU Jun-jie, LIU Yu-huai. Enhancing the performance of AlGaN deep-ultraviolet laser diodes without an electron blocking layer by using a thin undoped Al0.8Ga0.2N strip layer structure[J]. Chinese Optics. doi: 10.37188/CO.EN-2025-0033 |
AlGaN-based deep-ultraviolet (DUV) laser diodes (LDs) face performance challenges due to electron leakage and poor hole injection which is often worsened by polarization effects from conventional electron blocking layers (EBLs). To overcome these limitations, we propose an EBL-free DUV LD design incorporating a 1-nm undoped Al0.8Ga0.2N thin strip layer after the last quantum barrier. Using PICS3D simulations, we evaluate the optical and electrical characteristics. Results show a significant increase in effective electron barrier height (from 158.2 meV to 420.7 meV) and a reduction in hole barrier height (from 149.2 meV to 62.8 meV), which enhance hole injection and reduce electron leakage. The optimized structure (LD3) achieves a 14% increase in output power, improved slope efficiency (1.85 W/A), and lower threshold current. This design also reduces the quantum confined Stark effect and forms dual hole accumulation regions, improving recombination efficiency.
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