Research on high surface figure accuracy beam splitters with large incident angle for space communication
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摘要:
随着低轨卫星轨道的快速发展，卫星通信在全球覆盖和高速数据传输中的作用日益凸显，数据传输精度要求不断提高。分光镜作为空间卫星通信光学系统的核心元件，其光谱特性和面形精度直接影响整个通信系统的传输精度。本文依据光学薄膜干涉理论，选取合适的基底和镀膜材料，以带通结构为基础膜系完成45°大入射角
1550 nm高反射、1565 nm高透过分光镜的设计，并采用离子辅助电子束蒸发完成薄膜制备。结合镀膜设备实际配置，在传统单波长直接光控基础上，提出一种双波长监控方法，获得各膜层监控误差均小于1%的监控方案。基于双面应力平衡原则选择面形修正材料，通过建立基底矢高和面形修正层厚度的数学关系，精确计算面形修正层厚度，修正分光镜的面形。测试结果表明，在1550 nm处波长透射率为1.71%，1565 nm处波长透射率为98.51%，面形精度RMS达到0.0148 λ，优于λ/60（λ=632.8 nm），满足空间光通信系统应用需求。本文为具有入射角度高面形精度的分光镜膜系设计与制备提供一种有效方案，也对空间光通信光学系统优化具有重要意义。Abstract:With the rapid development of low Earth orbit satellites, satellite communication plays an increasingly prominent role in global coverage and high-speed data transmission, demanding ever-higher precision in data transfer. As a core component of space satellite communication optical systems, the spectral characteristics and surface figure accuracy of beam splitters directly affect the overall transmission performance of the system. Based on optical thin-film interference theory, this study selects suitable substrate and coating materials, and designs a dichroic beam splitter for
1550 nm high reflectance and1565 nm high transmittance at a large incident angle of 45° using a bandpass structure as the base multilayer design. The film is deposited via ion-assisted electron-beam evaporation. Considering the actual configuration of the coating equipment, a dual-wavelength monitoring method is proposed to improve upon traditional single-wavelength direct light control, achieving monitoring errors of less than 1% for each layer. By applying the principle of double-sided stress balance, appropriate figure correction materials are selected, and a mathematical relationship between substrate height deviation and correction layer thickness is established to precisely calculate the thickness of the figure correction layer. Corrected the surface figure accuracy of the beam splitter. Test results show that it achieves a transmittance of 1.71% at the1550 nm wavelength, 98.51% at the1565 nm wavelength, and a surface figure accuracy RMS of0.0148 λ, which is better than λ/60 at 632.8 nm, meeting the application requirements of space optical communication systems. This work provides an effective solution for designing and fabricating beam splitters with high surface figure accuracy under large incident angles, and holds significant implications for optimizing optical systems in space optical communications. -
图 1 法布里-珀珞（F-P）标准具薄膜形式
Figure 1. Schematic diagram of the Fabry-Perot etalon in a thin-film configuration
图 2 (a)长波通和(b)带通初始膜系设计
Figure 2. (a)Long-pass and (b)bandpass initial membrane system designs
图 3 (a)优化后理论透射光谱; (b)膜层物理厚度
Figure 3. (a)Transmission spectrum of the optimized design; (b)Physical thickness of the membrane layer
图 4 光学信号随膜层光学厚度变化曲线
Figure 4. The curve of optical signal variation with the optical thickness of the film layer
图 5 (a)双波长光学监控方案;(b)透射光谱;(c)SEM截面图;(d)反射面形图
Figure 5. (a) Dual-wavelength optical monitoring scheme;(b)Transmittance spectrum;(c)SEM cross-sectional image;(d)Reflective surface shape diagram
图 6 (a)后表面减反膜设计透射光谱;(b)基底的矢高与曲率半径示意图;(c)面形修正示意图
Figure 6. (a)Transmittance spectrum of the anti-reflection coating on the rear surface;(b)Diagram of the height and curvature radius of the substrate;(c)Diagram of surface shape correction
图 7 (a)添加不同厚度SiO2的透射光谱;(b)基底矢高随SiO2厚度变化拟合曲线;(c)分光镜透过率光谱;(d)分光镜反射面形
Figure 7. (a)Transmittance spectrum of SiO2 layers of varying thicknesses;(b)Fitted curve of substrate profile height as a function of SiO2 thickness;(c)Transmittance spectrum of the beam splitter;(d)Reflective surface profile of the beam splitter
表 1 分光镜技术参数
Table 1. Technical parameters
Parameter Specification Substrate JGS1 Incident angle /° 45 Reflection wavelength /nm 1550 Reflectance /% ≥95 Transmission wavelength /nm 1565 Transmittance /% ≥95 
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表 2 薄膜沉积工艺参数
Table 2. Thin film deposition process parameters
Material Substrate
Temperature /◦CVacuum Degree
/mbarDeposition
Rate /nm·s−1Flow Rate of O2 /sccm APS HPE Ta2O5 180 5×10−6 0.3 15 35 SiO2 0.7 15 15
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表 3 样品沉积分光膜前表面前后的面形数据
Table 3. Surface profile data from the front and back surfaces of the sample before integration with film
Category RMS /λ Power /λ Before depositing
After depositing0.0079 0.1082 0.0198
−0.3356
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表 4 沉积不同厚度SiO2基底面形精度变化数据
Table 4. Data on changes in surface profile accuracy of SiO2 substrates with varying thicknesses
Thickness of SiO2 /nm RMS /λ Power /λ Film stress /MPa 0 0.0069 0.0103 1000 0.0200 − 0.0327 −123.41 2000 0.0287 − 0.0753 −122.76 3000 0.0393 − 0.1159 −120.63 4000 0.0527 − 0.1592 −121.58 5000 0.0692 − 0.2024 −122.01 6000 0.0789 − 0.2439 −121.54 7000 0.0911 − 0.2839 −120.62 8000 0.1092 − 0.3159 −121.49
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表 5 基底沉积减反射膜前后的面形数据
Table 5. Surface profile data before and after the application of the anti-reflective coating
Category RMS /λ Power /λ Before depositing 0.0066 0.0165 After depositing 0.1253 0.0372
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