Citation: | BI Dan-dan, ZHANG Li-chao, SHI Guang. Optical coatings for projection objective immersion lithography[J]. Chinese Optics, 2018, 11(5): 745-764. doi: 10.3788/CO.20181105.0745 |
[1] |
姚汉民, 胡松, 刑延文.光学投影曝光微纳加工技术[M].北京:北京工业大学出版社, 2006, 12.
YAO H M, HU S, XING Y W. Optical Projection Exposure Technology of Micro and Nano Fabrication[M]. Beijing:Beijing University of Technology Press, 2006, 12.(in Chinese)
|
[2] |
BURN J L. Immersion lithography and its impact on semiconductor manufacturing[J]. Journal of Microlithography Microfabrication & Microsystems, 2004, 3(3):1-7. doi: 10.1117-1.1756917/
|
[3] |
PAUL A Z, BRYAN J R, EMIL C P, et al.. High index 193 nm immersion lithography:the beginning or the end of the road[J]. SPIE, 2009, 7274(20):1-11. http://d.old.wanfangdata.com.cn/OAPaper/oai_doaj-articles_c72a67e955016d9a4cbbd0ea0b0f55ff
|
[4] |
BERNHARD K, PAUL G, REINER G, et al.. Catadioptriclens design:the breakthrough to hyper-NA optics[J]. SPIE, 2006, 6154(20):1-9. http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1279406
|
[5] |
ZACZEK C, MULLENDER S, ENKISCH H, et al.. Coatings for next generation lithography[J]. SPIE, 2008, 7101:71010X. doi: 10.1117/12.796944
|
[6] |
Carl Zeiss SMT A G. Projection objective for immersion lithography: US, 7460206B2[P]. 2008-12-02.
|
[7] |
OHMORI K, ANDO T, TSUJI H, et al. Top coat investigation for immersion specific issue prevention[C]. 2nd International Symposium on Immersion Lithography, Bruges, Belgium, 2005: O22.
|
[8] |
LIBERMAN V, SWITKES M, ROTHSCHILD M, et al.. Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O[J]. SPIE, 2005, 5754:646-654. http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=861732
|
[9] |
ASML Netherlands B.V.. Lithographic apparatus and in-line cleaning apparatus: US, 2009195761A1[P]. 2009-08-06.
|
[10] |
LIBERMAN V, ROTHSCHILD M, SEDLACEK J H C, et al.. Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications[J]. Optics Letters, 1999, 24(1):58-60. doi: 10.1364/OL.24.000058
|
[11] |
LIBERMAN V, ROTHSCHILD M, SEDLACEK J H C, et al.. Marathon testing of optical materials for 193-nm lithographic applications[J]. SPIE, 1998, 3578:2-15. http://spie.org/x648.html?product_id=344432
|
[12] |
MURATA T, ISHIZAWA H, MOTOYAMA I, et al.. Preparation of high-performance optical coatings with fluoride nanoparticle films made from autoclaved sols[J]. Applied Optics, 2006, 45(7):1465-1468. doi: 10.1364/AO.45.001465
|
[13] |
02专项"高NA浸没光学系统关键技术研究"项目顺利通过专项任务内部验收.长春国科精密光学技术有限公司国科资讯[EB/OL].[2018-01-02]. http://www.cnepo.com.cn/index.php?id=1892.
02 special project 'Key Technology Research for High NA Immersion Optics System' passed the internal acceptance of the special task smoothly. Changchun National Extreme Precision Optics Co. Ltd. Information[EB/OL].[2018-01-02]. http://www.cnepo.com.cn/index.php?id=1892.(in Chinese)
|
[14] |
赵灵, 武潇野, 谷永强, 等.激光量热法测量深紫外氟化物薄膜吸收[J].中国激光, 2014, 41(8):0807001. http://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201408030.htm
ZHAO L, WU X Y, GU Y Q, et al.. Measuring the absorptance of deep ultraviolet fluoride coatings with laser calorimetry[J]. Chinese J. Lasers, 2014, 41(8):0807001.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201408030.htm
|
[15] |
张立超.溅射法制备多层膜沉积速率的标定[J].光学精密工程, 2010, 18(12):2530-2536. http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201012002
ZHANG L CH. Calibration of deposition rates of multilayer coatings by sputtering depositions[J]. Opt. Precision Eng., 2010, 18(12):2530-2536.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201012002
|
[16] |
张立超, 才玺坤, 时光.深紫外光刻光学薄膜[J].中国光学, 2015, 8(2):169-181. http://www.chineseoptics.net.cn/CN/abstract/abstract9262.shtml
ZHANG L CH, CAI X K, SHI G. Optical coatings for DUV Lithography[J]. Chinese Optics, 2015, 8(2):169-181.(in Chinese) http://www.chineseoptics.net.cn/CN/abstract/abstract9262.shtml
|
[17] |
KELKAR P, TIRRI B, WILKLOW R, et al.. Deposition and characterization of challenging DUV coatings[J]. SPIE, 2008, 7067:706-708. doi: 10.1117/12.794752
|
[18] |
薛春荣, 范正修, 邵建达.真空紫外光学薄膜及薄膜材料[J].激光与光电子学进展, 2008, 45(1):57-64. http://d.old.wanfangdata.com.cn/Periodical/jgygdzxjz200801010
XUE CH R, FAN ZH X, SHAO J D. Vaccum ultraviolet optical coatings and film materials[J]. Laser & Optoelectronics Progress, 2008, 45(1):57-64.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/jgygdzxjz200801010
|
[19] |
刘华松, 王利栓, 姜玉刚, 等.离子束溅射制备SiO2薄膜折射率与应力调整[J].光学精密工程, 2013, 21(9):2238-2243. http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201309005.htm
LIU H S, WANG L SH, JIANG Y G, et al.. Adjustments of refractive index and stress of SiO2 films prepared by IBS technology[J]. Opt. Precision Eng., 2013, 21(9):2238-2243.(in Chinese) http://www.cnki.com.cn/Article/CJFDTOTAL-GXJM201309005.htm
|
[20] |
俞侃, 包佳祺.基于等效层理论的薄膜滤光片中心波长消偏振膜系设计[J].光学精密工程, 2016, 24(1):45-49. http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201601007
YU K, BAO J Q. Design of thin film filter central wavelength depolarization stack based on equivalent layers theory[J]. Opt. Precision Eng., 2016, 24(1):45-49.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201601007
|
[21] |
包佳祺, 刘祥彪, 俞侃.长波通截止滤光片的消偏振设计[J].光学精密工程, 2016, 24(10s):82-86. http://cdmd.cnki.com.cn/Article/CDMD-10335-2005042001.htm
BAO J Q, LIU X B, YU K. Design of non-polarization long-wave-pass edge filter[J]. Opt. Precision Eng., 2016, 24(10s):82-86.(in Chinese) http://cdmd.cnki.com.cn/Article/CDMD-10335-2005042001.htm
|
[22] |
奥拉夫斯腾泽尔.光学薄膜材料的理论与实践[M].张立超, 才玺坤, 时光, 等, 译.北京: 国防工业出版社, 2017.
OLAF STENZEL. Optical Coating: Material Aspects in Theory and Practice[M]. ZHANG L CH, CAI X K, SHI G, et al., Transl. Beijing: National Defense Industry Press, 2017.(in Chinese)
|
[23] |
CHEN M F, CHANG H S, ALLAN S, et al.. Design of optical path for wide-angle gradient-index antireflection coatings[J]. Applied Optics, 2007, 46(26):6533-6538. doi: 10.1364/AO.46.006533
|
[24] |
张汝京, 等.纳米集成电路制造工艺[M].北京:清华大学出版社, 2014:161-171.
ZHANG R J, et al.. Nanoscale Integtated Circuits the Manufacturing Process[M]. Beijing:Tsinghua University Press, 2014:161-171.(in Chinese)
|
[25] |
CUI X M, DING R M, WANG M CH, et al.. A hydrophobic and abrasion-resistant MgF2 coating with an ultralow refractive index for double-layer broad band antireflective coating[J]. Journal of Materials Chemistry C, 2017, 5(12):3088-3096. doi: 10.1039/C6TC05307F
|
[26] |
YAN L H, DONG F Q, ZHAO S N, et al.. Hydrophobic MgF2 antireflective films with enhanced environmental durability by a sol-gel process[J]. Materials Letters, 2014, 129:156-158. doi: 10.1016/j.matlet.2014.05.036
|
[27] |
佐婧, 郭晓阳, 刘星元.基于旋涂法和电子束蒸发法制备的V2O5/Ag/V2O5叠层透明导电薄膜[J].发光学报, 2014, 35(3):360-365. http://kns.cnki.net/KCMS/detail/detail.aspx?filename=FGXB201403021&dbname=CJFD&dbcode=CJFQ
ZUO J, GUO X Y, LIU X Y. V2O5/Ag/V2O5 multilayer transparent conductive films based on sol-gel and electron beam evaporation techniques[J]. Chinese Journal of Luminescence, 2014, 35(3):360-365.(in Chinese) http://kns.cnki.net/KCMS/detail/detail.aspx?filename=FGXB201403021&dbname=CJFD&dbcode=CJFQ
|
[28] |
高娅娜, 许云龙, 张建华, 等.溶胶凝胶法制备以Al2O3为界面修饰层的铪铟锌氧薄膜晶体管[J].发光学报, 2016, 37(1):50-55. http://d.old.wanfangdata.com.cn/Periodical/fgxb201601009
GAO Y N, XU Y L, ZHANG J H, et al.. Solution processed HfInZnO thin film transistors with HfSiOx dielectrics modified by Al2O3 films[J]. Chinese Journal of Luminescence, 2016, 37(1):50-55.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/fgxb201601009
|
[29] |
NOACK J, SCHEURELL K, KEMNITZ E, et al.. MgF2 antireflective coatings by sol-gel processing:film preparation and thermal densification[J]. J. Mater Chem., 2012, 22(35):18535-18541. doi: 10.1039/c2jm33324d
|
[30] |
王宇, 李博颖, 裴伶会, 等.干拉法制备散射偏光片实验研究[J].液晶与显示, 2017, 32(6):438-442. http://d.old.wanfangdata.com.cn/Periodical/yjyxs201706004
WANG Y, LI B Y, PEI L H, et al.. Experimental research on preparation of scattering polarizer by dry stretching method[J]. Chinese Journal of Liquid Crystals and Displays, 2017, 32(6):438-442.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/yjyxs201706004
|
[31] |
ISHIZAWA H, NⅡSAKA S, MURATA T, et al.. Preparation of MgF2-SiO2 thin films with a low refractive index by a solgel process[J]. Applied Optics, 2008, 47(13):C200-C205. doi: 10.1364/AO.47.00C200
|
[32] |
村田剛.フッ化マグネシウムナノ粒子を用いた高性能反射防止膜の研究[D].名古屋市: なごやだいがく/名古屋大学, 2012.
|
[33] |
DING R M, CUI X M, ZHANG C, et al.. Tri-wavelength broadband antireflective coating built from refractive index-controlled MgF2 films[J]. J. Mater Chem. C, 2015, 3:3219-3224. doi: 10.1039/C4TC02542C
|
[34] |
CUI X M, DING R M, WANG M CH, et al.. In situ surface assembly derived ultralow refractive index MgF2-SiO2 hybrid film for tri-layer broadband antireflective coating[J]. Adv. Optical Mater, 2016, 4:722-730. doi: 10.1002/adom.v4.5
|
[35] |
尚洪波, 刘春来, 张巍, 等.膜系引入偏振相差对投影光刻物镜设计的影响与改进[J].光学学报, 2015, 35(1):0122003. http://kns.cnki.net/KCMS/detail/detail.aspx?filename=gxxb201501040&dbname=CJFD&dbcode=CJFQ
SHANG H B, LIU CH L, ZHANG W, et al.. Effects and improvements of coating induced polarization aberration on lithography lens design[J]. Acta Optica Sinica, 2015, 35(1):0122003.(in Chinese) http://kns.cnki.net/KCMS/detail/detail.aspx?filename=gxxb201501040&dbname=CJFD&dbcode=CJFQ
|
[36] |
株式会社尼康.光学元件和曝光装置: 中国, CN200480024324.3[P]. 2004-12-03.
Nikon Corporation. Optical element and exposure device: China, CN200480024324.3[P]. 2004-12-03.(in Chinese)
|
[37] |
Taiwan Semiconductor Manufacturing Company. Anti-corrosion layer on objective lens for liquid immersion lithography applications: US, 20050100745A1[P]. 2005-05-12.
|
[38] |
Carl Zeiss SMT AG. Method of processing an optical element and an optical, in particular for a microlithographic projection exposure apparatus: US, 20080309905A1[P]. 2008-12-18.
|
[39] |
LIBERMAN V, SWITKES M, ROTHSCHILD M, et al.. Studies of consequences of photo-acid generator leaching in 193 nm immersion lithography[J]. SPIE, 2006, 6154:1-12. http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1279396
|
[40] |
崔铮.微纳米加工技术及其应用[M].北京:高等教育出版社, 2013, 4.
CUI ZH. Micro-Nano Fabrication Technologies and Applications[M]. Beijing:Higher Education Press, 2013, 4. (in Chinese)
|
[41] |
剧永波, 陈建军, 张宸铭, 等.LTPS工艺中光刻胶与膜层粘附力的研究[J].液晶与显示, 2017, 32(3):190-195. http://d.old.wanfangdata.com.cn/Periodical/yjyxs201703005
JU Y B, CHEN J J, ZHANG CH M, et al.. Photoresist and film adhesive force in LTPS process[J]. Chinese Journal of Liquid Crystals and Displays, 2017, 32(3):190-195.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/yjyxs201703005
|
[42] |
PIC N, MARTIN C, VITALIS M, et al.. Defectivity decrease in the photolithography process by AMC level reduction through implementation of novel fiteration and monitoring solutions[J]. SPIE, 2010, 7638:76380M. doi: 10.1117/12.845591
|
[43] |
WANG D Y, LIU J R, KANG D, et al.. Blob defect prevention in 193nm topcoat-free immersion lithography[J]. SPIE, 2012, 8325:83252G1-8. doi: 10.1117/12.916818
|
[44] |
叶雄英, 李子尚, 冯金扬, 等.基于二氧化硅溅射的PMMA和PDMS亲水改性[J].光学精密工程, 2014, 22(8):2096-2102. http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201408017
YE X Y, LI Z SH, FENG J Y, et al.. Hydrophilic modification of PMMA and PDMS based on silicon dioxide sputtering[J]. Opt. Precision Eng., 2014, 22(8):2096-2102.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201408017
|
[45] |
刘剑, 王明乐, 李园园, 等.偏振光照对偶氮苯侧链聚硅氧烷膜表面能的提高[J].液晶与显示, 2011, 26(5):577-581. http://d.old.wanfangdata.com.cn/Periodical/yjyxs201105002
LIU J, WANG M L, LI Y Y, et al.. Promotion of surface free energy of azobenzene containing side-chain liquid crystalline polysiloxane film by polarized light[J]. Chinese Journal of Liquid Crystals and Displays, 2011, 26(5):577-581.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/yjyxs201105002
|
[46] |
WAKANA K, TSUSHIMA H, MATSUMOTO S, et al.. Optical performance of laser light source for ArF immersion double patterning lithography tool[J]. SPIE, 2009, 7274:72743J-1. http://www.sciencedirect.com/science/article/pii/S1386947707006765
|
[47] |
朱美萍, 孙建, 张伟丽, 等.高性能偏振膜的研制[J].光学精密工程, 2016, 24(12):2908-2915. http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201612004
ZHU M P, SUN J, ZHANG W L, et al.. Development of high performance polarizer coatings[J]. Opt. Precision Eng., 2016, 24(12):2908-2915.(in Chinese) http://d.old.wanfangdata.com.cn/Periodical/gxjmgc201612004
|
[48] |
APELO, MANN K, ZOLLER A, et al.. Nonlinear absorption of thin Al2O3 films at 193 nm[J]. Appl. Opt., 2000, 39(18):3165-3169. doi: 10.1364/AO.39.003165
|
[49] |
LIBERMAN V, ROTHSCHILD M, PALMACCI S T, et al.. Acceleratated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation[J]. SPIE, 2003, 5040:1631-1638. https://www.spiedigitallibrary.org/redirect/proceedings/proceeding?doi=10.1117/12.485470
|
[50] |
LIBERMAN V, PALMACCI S T, HARDY D E, et al.. Controlled contamination studies in 193-nm immersion lithography[J]. SPIE, 2005, 5754:148-153. doi: 10.1117/12.601473.short
|
[51] |
LIBERMAN V, ROTHSCHILD M, PALMACCI S T, et al.. Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography[J]. SPIE, 2007, 6(1):013001. https://www.researchgate.net/publication/240964391_Impact_of_photoacid_generator_leaching_on_optics_photocontamination_in_193-nm_immersion_lithography
|