Volume 11 Issue 5
Oct.  2018
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BI Dan-dan, ZHANG Li-chao, SHI Guang. Optical coatings for projection objective immersion lithography[J]. Chinese Optics, 2018, 11(5): 745-764. doi: 10.3788/CO.20181105.0745
Citation: BI Dan-dan, ZHANG Li-chao, SHI Guang. Optical coatings for projection objective immersion lithography[J]. Chinese Optics, 2018, 11(5): 745-764. doi: 10.3788/CO.20181105.0745

Optical coatings for projection objective immersion lithography

doi: 10.3788/CO.20181105.0745
Funds:

the National Science and Technology Major Project of the Ministry of Science and Technology of China 2009ZX02205

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  • Author Bio:

    BI Dan-dan(1992—), female, born in the city of Jilin, Jilin Province, who is a master-degree student studying at Changchun Institute of Optics, Fine Mechanics and Physics under Chinese Academy of Sciences and is mainly engaged in the optical coating technology research. E-mail:bidandan15@mails.ucas.ac.cn

    ZHANG Li-chao(1979—), male, born in the city of Jilin, Jilin Province, who is a doctor-degree researcher with bachelor and master degrees from Jilin University obtained respectively in 2000 and 2003 as well as the doctor degree from Changchun Institute of Optics, Fine Mechanics and Physics under Chinese Academy of Sciences and is mainly engaged in the optical coating technology research. E-mail: zhanglic@klao.ac.cn

    SHI Guang(1985—), female, born in the city of Jixi, Heilongjiang Province, who is an assistant researcher with bachelor and master degrees from University of Electronic Science and Technology of China obtained respectively in 2008 and 2011 and is mainly engaged in the deep ultraviolet optical coating research. E-mail:nrconnie@163.com

  • Corresponding author: ZHANG Li-chao, E-mail:zhanglc@sklao.ac.cn
  • Received Date: 20 Oct 2017
  • Rev Recd Date: 15 Dec 2017
  • Publish Date: 01 Oct 2018
  • The deep ultraviolet lithography is currently a main method for integrated circuit manufacture. The immersive projection objective must be used to increase resolution of the optical system for realization of smaller component feature dimensions. Therefore a number of rigorous requirements for optical coating component are put forward. In this paper we present designs of the film material and film system applicable to immersive lithographical system as well as the large angle polarization-maintaining film system required for optical systems at high NA. Key issues about immersion environment adaptability, hydrophobicity and anti-contamination of the immersion coating most critical to the objective are discussed. Laser irradiation lifetime of the coated components especially in the immersion environment that is an important factor to evaluate performance of the immersive lithographical system is analyzed.

     

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