微分干涉差共焦显微膜层微结构缺陷探测系统

戴岑; 巩岩; 张昊; 李佃蒙; 薛金来

doi:10.3788/CO.20181102.0255

Volume 11 Issue 2

Apr. 2018

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Chinese Optics > 2018 > 11(2): 255-264.

DAI Cen, GONG Yan, ZHANG Hao, LI Dian-meng, XUE Jin-lai. Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy[J]. Chinese Optics, 2018, 11(2): 255-264. doi: 10.3788/CO.20181102.0255

Citation:

DAI Cen, GONG Yan, ZHANG Hao, LI Dian-meng, XUE Jin-lai. Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy[J]. Chinese Optics, 2018, 11(2): 255-264. doi: 10.3788/CO.20181102.0255

Citation:

DAI Cen, GONG Yan, ZHANG Hao, LI Dian-meng, XUE Jin-lai. Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy[J]. Chinese Optics, 2018, 11(2): 255-264. doi: 10.3788/CO.20181102.0255

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Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy

doi: 10.3788/CO.20181102.0255

DAI Cen^{1, 2
,},
GONG Yan^{1, 3
,
,},
ZHANG Hao^{1, 2},
LI Dian-meng³,
XUE Jin-lai¹

1.
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China
3.
Suzhou Institution of Biomedical Engineering and Technology, Chinese Academy of Sciences, Suzhou 215163, China

Funds:

Jilin Provincial Major S & T Special Project 20140203001GX

More Information

Corresponding author: GONG Yan, ygong2000@sina.com
Received Date: 13 Nov 2017
Rev Recd Date: 16 Dec 2017
Publish Date: 01 Apr 2018

Abstract

Abstract

Defects in the multilayer extreme ultraviolet lithography(EUV) mask "whiteboard" have become an important issue to restrict the development of next-generation lithography. A detection system based on differential interference contrast(DIC) confocal microscopy is proposed in order to improve the ability of distinguishing the microstructure defects on the lithography mask "whiteboard". Based on the scalar diffraction theory, the lateral and axial resolution of the system are calculated. In the condition that numerical aperture of 0.65 and working wavelength of 405 nm, resolutions of DIC confocal microscopy, traditional microscopy and the confocal microscopy system are compared and analyzed using MATLAB. The results show that the DIC confocal microscopy has the ability of lateral resolution of 230 nm and resolution of axial step height difference of 25 nm(corresponding to defects such as scratches). In addition, the effect of factors such as the size of detector and the axial deviation of the sample are also simulated and analyzed. The experimental results show that the proposed system can detect multilayer coating microstructure defects with a width of 200 nm and a height of 10 nm, which has better detection ability than the other two systems.
- confocal microcopy,
- differential interference contrast (DIC),
- scalar diffraction,
- coating structure,
- defects detecting

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References(22)

References

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