Volume 14 Issue 5
Sep.  2021
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ZHONG Zhi-jian, LI Chen-yi, LI Shi-guang, GUO Lei, WEI Ya-yi. Budget analysis of focus control in advanced lithography (I) -optical path[J]. Chinese Optics, 2021, 14(5): 1104-1119. doi: 10.37188/CO.2021-0033
Citation: ZHONG Zhi-jian, LI Chen-yi, LI Shi-guang, GUO Lei, WEI Ya-yi. Budget analysis of focus control in advanced lithography (I) -optical path[J]. Chinese Optics, 2021, 14(5): 1104-1119. doi: 10.37188/CO.2021-0033

Budget analysis of focus control in advanced lithography (I) -optical path

doi: 10.37188/CO.2021-0033
Funds:  Supported by National Natural Science Foundation of China (No. 61804174; No. 61604172)
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  • Corresponding author: lishiguang@tsinghua.org.cn
  • Received Date: 2021-02-01
  • Rev Recd Date: 2021-03-08
  • Available Online: 2021-04-30
  • Publish Date: 2021-09-18
  • As the technology node of large-scale integrated circuits continues to shrink, the focus control of the lithographic tools becomes particularly difficult. In order to ensure the exposure quality of wafers, it is necessary to quickly and accurately adjust the wafer in the Depth of Focus (DOF) to a degree as small as few dozen of nanometers. For this reason, people need to carefully analyze the various factors that cause defocusing or process window changes in the lithographic process, make a reasonable focus control budget, and control the various error factors within a certain range. This paper focuses on Extreme Ultraviolet (EUV) lithography, reviews the factors that affect focus control in the optical path of an advanced EUV lithographic tool and summarizes their principles, simulation and experimental results. It can provide a reference when conducting advanced lithography focus control budget research.
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