一种基于衍射条纹反演计算的线栅分辨率提升方法

胡锦泽; 李捷; 胡坚; 李昊; 陈金平; 郭旭东; 柯常军; 韩胜会; 杨国强; 樊仲维

doi:10.37188/CO.2026-0009

一种基于衍射条纹反演计算的线栅分辨率提升方法

doi: 10.37188/CO.2026-0009

cstr: 32171.14.CO.2026-0009

胡锦泽^{1, 2},
李捷^{1, 2, ,},
胡坚^{1, 2},
李昊^{3, 4},
陈金平^{3, 4},
郭旭东^{5, 6},
柯常军^{1, 2},
韩胜会⁷,
杨国强^5,,
樊仲维^2, ,

1.
中国科学院空天信息创新研究院, 北京 100094
2.
中国科学院大学光电学院, 北京 100049
3.
中国科学院理化技术研究所光化学转换与功能材料重点实验室, 北京 100190
4.
中国科学院大学未来技术学院, 北京 100049
5.
北京分子科学国家研究中心, 中国科学院化学研究所光化学重点实验室, 北京 100190
6.
中国科学院大学化学科学学院, 北京 100049
7.
全南国立大学机械工程学院, 韩国光州 61186

基金项目: 国家重点研发计划项目（No. 2024YFE0205800，No. 2021YFB3602600）；中国科学院项目（No. GJJSTD20200009，No. 2018-131-S）；国家自然科学基金（No. 62121003，No. 10010108B1339-2451，No. 62405332，No. 62427901）；北京科学技术委员会项目（No. Z221100006722008）

详细信息

作者简介:
李　捷（1989—），男，浙江杭州人，博士，研究员，博士生导师，2018年于美国中佛罗里达大学获得博士学位，主要从事超快飞秒激光与高次谐波技术的研究。E-mail：lijie430@aircas.ac.cn

杨国强（1963—），男，安徽阜阳人，博士，教授，博士生导师，1991年于中国科学院感光化学研究所获得博士学位，主要从事有机光功能化合物的设计、合成、性能及其作用机理等方面的研究。E-mail：gqyang@iccas.ac.cn

樊仲维（1965—）男，吉林桦甸人，博士，教授，博士生导师，1997年于中国科学院长春光学精密机械与物理研究所获得博士学位，主要从事短脉冲激光峰值功率提升、光束质量控制和系统集成关键技术研究。E-mail：fanzhongwei@aircas.ac.cn

中图分类号: TP394.1;TH691.9
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出版历程
- 网络出版日期: 2026-05-09

A resolution enhancement method for line gratings based on inverse calculation of diffraction fringes

HU Jin-ze^{1, 2},
LI Jie^{1, 2
, ,},
HU Jian^{1, 2},
LI Hao^{3, 4},
CHEN Jin-ping^{3, 4},
GUO Xu-dong^{5, 6},
KE Chang-jun^{1, 2},
HAN Shenghui⁷,
YANG Guo-qiang^5
,,
FAN Zhong-wei^{2
, ,}

1.
Aerospace Information Research Institute, Chinese Academy of Sciences, Beijing 100094, China
2.
School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China
3.
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institude of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, China
4.
School of Future Technology, University of Chinese Academy of Sciences, Beijing 100049, China
5.
Key Laboratory of Photochemistry, Institude of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
6.
School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
7.
School of Mechanical Engineering, Chonnam National University, Gwangju, Republic of Korea 61186

Funds: Supported by National Key Research and Development Program of China (No. 2024YFE0205800, No. 2021YFB3602600); Chinese Academy of Sciences (No. GJJSTD20200009, No. 2018-131-S); National Natural Science Foundation of China (No. 62121003, No. 10010108B1339-2451, No.62405332, No. 62427901); Beijing Municipal Science and Technology Commission (No. Z221100006722008)

More Information

Corresponding author: lijie430@aircas.ac.cn; fanzhongwei@aircas.ac.cn

摘要

摘要:
为低成本、高效率表征EUV光刻胶，本研究构建了一套基于桌面级高次谐波产生（High-Harmonic Generation, HHG）源与反射式干涉仪的光刻评估系统。光束线采用515 nm飞秒激光激发氩气产生高次谐波，经轮胎镜聚焦和闪耀光栅分光后，由狭缝选取第11阶谐波（46.8 nm）作为EUV光源。以磺酸肟酯修饰的聚苯乙烯（PSOS）非化学放大型光刻胶为测试对象，分别采用劳埃镜和对称双镜进行干涉曝光。针对样品面与对称双镜间的对准难题，提出了一种基于衍射条纹反演计算的光学测距方法，实现了对称双镜的精确定位。实验结果表明：采用劳埃镜可实现周期125 nm、高对比度的清晰线栅图案，完成待测材料百纳米级分辨率的表征；经衍射条纹反演法精确定位后，利用对称双镜可制备出周期60 nm的线栅图案，显著提升了系统的分辨能力。本研究展示的评估系统为光刻胶材料的快速筛选、分辨率极限研究及相关工艺开发提供了一个成本低、可推广的实验平台。
- 高次谐波 /
- 光刻 /
- 干涉曝光 /
- 极紫外
Abstract:
To enable low-cost and efficient characterization of EUV photoresists, a lithographic evaluation system based on a tabletop high-harmonic generation (HHG) source and a reflective interferometer was developed. High-order harmonics were generated in argon using a 515 nm femtosecond laser. After focusing by a toroidal mirror and spectral dispersion by a blazed grating, the 11th harmonic (46.8 nm) was selected through a slit as the EUV source. Nonchemically amplified resists based on oxime sulfonate-functionalized polystyrene (PSOS) were used as the test material, and interference exposure was performed with a Lloyd’s mirror and a symmetric dual-mirror configuration. To solve the alignment problem between the sample plane and the symmetric dual-mirror interferometer, an optical ranging method based on diffraction-fringe inversion was proposed, enabling precise positioning of the symmetric dual-mirror interferometer. The results show that the Lloyd’s mirror produces clear high-contrast line-space patterns with a period of 125 nm and enables characterization of the tested resist at the 100 nm scale. After precise positioning by diffraction-fringe inversion, the symmetric dual-mirror configuration produces line-space patterns with a period of 60 nm, significantly improving the system resolution. This evaluation system provides a low-cost and scalable experimental platform for rapid screening of photoresist materials, investigation of resolution limits, and development of related lithographic processes.
- high-order harmonics /
- lithography /
- interference exposure /
- extreme ultraviolet

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图 1 由金属膜、轮胎镜、闪耀光栅以及狭缝组合的单色仪

Figure 1. Monochromator composed of a metal film, a toroidal mirror, a blazed grating, and a slit

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图 2 (a)劳埃镜干涉光刻中几何关系图；(b)对称双镜干涉光刻中几何关系图

Figure 2. Geometric configurations in (a) Lloyd’s-mirror and (b) symmetric dual-mirror interference lithography

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图 3 EUV光刻光束线

Figure 3. EUV lithography beamline

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图 4 实现相位匹配后，铝膜后300 mm处的EUV光斑形貌

Figure 4. EUV beam profile at 300 mm behind the aluminum film after phase matching

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图 5 铝膜后的EUV光谱分布图

Figure 5. EUV spectrum behind the aluminum film

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图 6 11阶谐波的能量变化

Figure 6. Energy variation of the 11th-order harmonic

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图 7 对称双镜装置图，$ {l}_{0}、{l}_{\mathrm{i}} $分别为镜面边缘与光刻胶平面的初始距离、理想距离

Figure 7. Schematic diagram of the symmetric dual-mirror setup, where $ {l}_{0} $ and $ {l}_{\mathrm{i}} $ denote the initial and ideal distances, respectively, from the mirror edge to the photoresist plane

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图 8 (a)、(b)劳埃镜（$ \theta =10{\text{°}} $）制备的线栅；(c)劳埃镜（$ \theta =20{\text{°}} $）制备的线栅；(d)对称双镜（$ \theta =10{\text{°}} $）制备的线栅

Figure 8. Line gratings fabricated by (a), (b) Lloyd’s mirror ($ \theta =10{\text{°}} $); (c) Lloyd’s mirror ($ \theta =20{\text{°}} $) and (d) symmetric dual-mirror ($ \theta =10{\text{°}} $).

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图 9 11阶谐波的光斑形貌

Figure 9. Beam profile of the 11th harmonic

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图 10 劳埃镜（$ \theta =10{\text{°}}、20{\text{°}} $）和对称双镜（$ \theta =10{\text{°}} $）所制备的线栅周期数据

Figure 10. Measured periods of line gratings fabricated by Lloyd’s mirror (θ = 10°, 20°) and symmetric dual-mirror interferometer (θ = 10°)

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图 11 (a)调节距离后,对称双镜装置（$ \theta =10{\text{°}} $）中，镜面边缘引发的衍射条纹；(b)$ l=104.8~\text{μm} $时，所获得菲涅耳直边衍射条纹的仿真结果

Figure 11. (a) Diffraction fringes induced by the mirror edge in the symmetric dual-mirror setup($ \theta =10{\text{°}} $) after distance adjustment; (b) simulated Fresnel straight-edge diffraction fringes at $ l=104.8~ $ μm

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