可见/近红外多波段激光滤光膜的研制

辛亚武; 彭永超; 张宇翔; 曹兴宇; 韩阳; 郭洪玲; 熊仕富; 胡章贵

doi:10.37188/CO.EN-2025-0031

可见/近红外多波段激光滤光膜的研制

1.
天津理工大学功能晶体研究院晶体材料全国重点实验室天津市功能晶体材料重点实验室, 天津 300384
2.
北京欧普特科技有限公司, 北京 100015
3.
天津理工大学集成电路科学与工程学院天津市薄膜电子与通信器件重点实验室, 天津 300384

详细信息

中图分类号: O482.31
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出版历程
- 收稿日期: 2025-05-11
- 录用日期: 2025-07-15
- 网络出版日期: 2025-08-27

Development of visible/near-infrared multiband laser filter film

doi: 10.37188/CO.EN-2025-0031

1.
State Key Laboratory of Crystal Materials, Tianjin Key Laboratory of Functional Crystal Materials, Institute of Functional Crystals, Tianjin University of Technology Tianjin 300384, China
2.
Beijing Golden Way Scientific Co., Ltd, Beijing, 100015, China
3.
Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, Tianjin, 300384, China

Funds: Supported by the National Natural Science Foundation of China (No. 62304152)

More Information

Author Bio:
XIN Ya-wu is currently a Master’s student at Tianjin University of Technology. He received his BE degree in Optoelectronic Information Science and Engineering from Nanyang Institute of Technology in 2022. His research interests focus on visible and infrared optical coatings design and fabrication. E-mail: xyw_optics@163.com

XIONG Shi-fu is an assistant researcher at the Functional Crystal Institute of Tianjin University of Technology, where he is also the director of the crystal coating laboratory. He graduated from Changchun University of Science and Technology in 2018 with a Ph.D. in optical engineering, and his main research direction is the development and performance evaluation of precision optical thin films. E-mail: xsf_optics@126.com

Corresponding author: xsf_optics@126.com

摘要

摘要:
滤光片作为光电探测系统中的关键部件，能够简化光学系统并提高探测效率。根据使用需求，需要设计并制备出一种多达5个波段的可见/近红外滤光膜，同时满足2个波段高反射和3个波段高透过的要求。因此，本文对膜系设计、薄膜制备工艺以及膜层厚度的控制精度进行了系统研究。在本工作中，将短波通膜系与长波通膜系进行叠加，并调整膜系的周期数和匹配系数，以满足截止波段的要求。此外，运用Smith方法对带通膜系进行优化透过波段，从而完成可见/近红外多波段激光滤光膜的设计。在制备过程中，结合膜层的灵敏度，通过反演分析对各光学监控片所监控的膜层。对监控过程中光信号较弱的光学监控方案进行模拟和修正，并匹配光信号较强的监控波长，进而提高了膜层厚度的控制精度以及在指定波长范围内的透过率。最终，制备的滤光膜实际物理厚度为9.66微米，与理论设计厚度的误差小于0.4%，且3个透过波段的透过率均超过99%。在455~500 nm和910~1000 nm波段的平均透过率分别为0.45%和0.16%。
- 光学薄膜 /
- 多波段 /
- 薄膜系统设计 /
- 逆向分析
Abstract:
Filters, as a key component in the photoelectric detection system, can simplify the optical system and improve detection efficiency. Based on the usage requirements, a visible/near-infrared filter film with up to 5 wavebands needs to be designed and prepared, while simultaneously satisfying high reflection in 2 wavebands and high transmittance in 3 wavebands. Therefore, we have conducted a systematic study on the film design, thin film preparation process, and control accuracy of film layer thickness. In this work, the short-wave pass film system is superimposed with the long-wave pass film system, and the number of cycles and matching coefficient of the film system are tuned to meet the requirements of cut-off band. Additionally, Smith method was used to match bandpass film system to optimize the transmission band and complete the visible/near infrared multiband laser filter film design. In the preparation process, combined with the sensitivity of the film layer, inverse analysis is used to invert the film layer monitored by each optical monitoring chip. The optical control scheme with weak optical signal in the monitoring process is simulated and corrected, and the monitoring wavelength with stronger optical signal is matched, resulting in an improvement of the control accuracy for the film thickness and the transmittance in the specified wavelength range. Ultimately, the actual physical thickness is 9.66 μm, and the error with the theoretical design thickness is less than 0.4%, and the transmittance of the specified 3 wavebands exceeds 99%. The average transmittance of the cut-off bands at the 455−500 nm and 910−1000 nm is 0.45% and 0.16%, respectively.
- optical film /
- multiband /
- film system design /
- reverse analysis

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Figure 1. Transmittance spectral curves of (a) long-wavelength-passing and (b) short-wavelength-passing with different period numbers, (c) superimposed transmittance spectral curves of film system at period number S₁=8, S₂=15, (d) initial design and (e) optimized design transmittance spectral curve, (f) transmittance spectral curve of antireflection film.

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Figure 2. Optical monitoring design of multiband laser filter film (a) 1^# (b) 2^# (c) 3^#.

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Figure 3. (a) Measured and designed transmittance spectral curve of film, (b)1^# (c) 2^# (d) 3^# measured and designed transmittance spectral curves for optical controls, (e) physical thickness of the film layer, (f) sensitivity of the film layer.

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Figure 4. Adjusted 2^# optical monitoring (a) design scheme and (b) experimental test transmittance spectral curve, measured and design transmittance spectral curves for (c) single-sided and (d) double-sided films.

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Figure 5. (a) Cross-sectional morphology of multiband laser filter film. (b) Uncoated substrate surface shapes. (c) Single-sided coated surface shapes. (d) Double-sided coated surface shapes.

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Table 1. Technical parameters of multiband laser filter film.

Parameter	Specification
Angle /°	0
Transmission band /nm	880 & 1064 & 1083& 1342
Transmittance /%	≥99
Waveband of cut−off region /nm	455-500 & 910-1000
Transmittance of cut−off region /%	<1

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Table 2. Equipment process parameters.

Material	Substrate Temperature/^◦C	Degree of Vacuum/mbar	Deposition Rate/nm·s⁻¹	Flow Rate of O₂/sccm
Material	Substrate Temperature/^◦C	Degree of Vacuum/mbar	Deposition Rate/nm·s⁻¹	APS	HPE
Ta₂O₅	180	5×10⁻⁵	0.3	15	35
SiO₂	180	5×10⁻⁵	0.7	25	25

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Table 3. Spectral theoretical values and period numbers.

Cycles number of S₁	T_455-500nm /%	Cycles number of S₂	T_910-1000nm /%
2	43.23	3	44.66
4	10.68	6	12.49
6	2.42	9	5.70
8	0.56	12	0.87
10	0.13	15	0.12
12	0.02	18	0.07

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