铷原子饱和吸收光谱与偏振光谱对 780 nm半导体激光器稳频的比较

王杰; 高静; 杨保东; 张天才; 王军民

Volume 4 Issue 3

Jun. 2011

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Article Contents

Chinese Optics > 2011 > 4(3): 305-312.

WANG Jie, GAO Jing, YANG Bao-dong, ZHANG Tian-cai, WANG Jun-min. Comparison of frequency locking of 780 nm diode laser via rubidium saturated absorption and polarization spectroscopies[J]. Chinese Optics, 2011, 4(3): 305-312.

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Comparison of frequency locking of 780 nm diode laser via rubidium saturated absorption and polarization spectroscopies

State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics,Shanxi University,Taiyuan 030006,China

Received Date: 12 Feb 2011
Rev Recd Date: 23 Apr 2011
Publish Date: 25 Jun 2011

Abstract

Abstract

Locking laser frequency to an available reference standard can efficiently suppress the fluctuation of laser frequency and improve the frequency stability. In this paper, the Saturated Absorption Spectroscopy(SAS) and the Polarization Spectroscopy(PS) of rubidium D2 line were used to obtain the frequency discrimination curves. Then the error correcting signals from the frequency discrimination were sent in negatively feedback to the piezeo-electric transducer of a 780 nm external-cavity diode laser(ECDL) by electronic servo-system to realize the laser frequency locking. The basical principles and experimental schemes of two methods were introduced and the experimental results were compared. It shows that the residual fluctuations of laser frequency after being locked by using the two schemes are approximately 1.5 MHz and 0.6 MHz, respectively, compared with that of about 6.6 MHz for the case of ECDL free running. Furthermore, the PS scheme shows better frequency stability than SAS scheme, for SAS brings extra frequency noise by use of the phase sensitive detection which needs to modulate the laser frequency, while PS scheme is completely modulation-free.
- polarization spectroscopy,
- saturated absorption spectroscopy,
- laser frequency stabilization,
- modulation free,
- rubidium atomic vapor cell

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