Volume 9 Issue 2
Apr.  2016
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MA Zhan-long, PENG Li-rong, WANG Gao-wen, GU Yong-qiang. High-precision CGH substrate figuring by ion beam[J]. Chinese Optics, 2016, 9(2): 270-276. doi: 10.3788/CO.20160902.0270
Citation: MA Zhan-long, PENG Li-rong, WANG Gao-wen, GU Yong-qiang. High-precision CGH substrate figuring by ion beam[J]. Chinese Optics, 2016, 9(2): 270-276. doi: 10.3788/CO.20160902.0270

High-precision CGH substrate figuring by ion beam

doi: 10.3788/CO.20160902.0270
  • Received Date: 03 Dec 2015
  • Accepted Date: 28 Dec 2015
  • Publish Date: 25 Jan 2016
  • Computer-generated hologram(CGH) is widely applied in the high-precision testing of asphere as high-accuracy null compensator, but the surface figure error of CGH substrate directly restricts the testing precision. In order to gain ultra-precision CGH substrates, the figuring of high-precision CGH substrates by ion beam is presented. A square fused silicon CGH substrate with 152 mm side length(140 mm valid aperture) and 6.35 mm thickness is figured by different scale IBF removal functions. Through seven iterations, an ultra-precision CGH substrate with transmitted wavefront PV value 20.779 nm and RMS value 0.685 nm is gained finally. The experiment result shows that figuring high-precision CGH substrates by ion beam has notable advantage, and it has not only high process efficiency but also ultra-high process precision.

     

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