Volume 8 Issue 2
Apr.  2015
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JIANG Yan-xiu, HAN Jian, LI Wen-hao, Bayanheshig. Characteristic analysis for different beamsplitters of the plane holographic grating lithography system[J]. Chinese Optics, 2015, 8(2): 241-247. doi: 10.3788/CO.20150802.0241
Citation: JIANG Yan-xiu, HAN Jian, LI Wen-hao, Bayanheshig. Characteristic analysis for different beamsplitters of the plane holographic grating lithography system[J]. Chinese Optics, 2015, 8(2): 241-247. doi: 10.3788/CO.20150802.0241

Characteristic analysis for different beamsplitters of the plane holographic grating lithography system

doi: 10.3788/CO.20150802.0241
  • Received Date: 13 Nov 2014
  • Accepted Date: 12 Jan 2015
  • Publish Date: 25 Apr 2015
  • The beamsplitter has a critical role in the interference lithography, which splits one laser beam into two, therefore these two waves can interfere to produce the fringes. The instability of the interference lithography, which is determined by the selection of the beamsplitter, not only decreases the contrast of the patterns, but also causes the phase distortion, high scatter light and low quality of the groove. To improve the stability of the interference lithography system, based on the period equation of the fringes and the correction between deviation of the incidence and the interference beam angular variations(2<em>θ</em>), we discuss the phase distortion due to the alignment error of cube and the grating beamsplitter, and analyze the stability of the two different interference lithography system. Results indicate that in the grating manufacture, using the grating as the beamsplitter instead of the cube beamsplitter can increase the stability of lithography system by 5 to 6 orders of magnitude, which has a significant effect on grating fabrication with long-time exposure.

     

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