Monitoring and controlling system for high power CO₂ laser in "LPP-EUV" light source

[1] 谢常青,叶甜春. 极端远紫外光刻技术[J]. 半导体情报,2011,38(5):28-32. XIE C Q,YE T CH. Extreme ultraviolet lithography technology[J]. Semiconductor Information,2011,38(5):28-32.(in Chinese) [2] 王占山,曹建林,陈星旦. 极紫外投影光刻技术[J]. 科学通报,1998,43(8):785-791. WANG Z SH,CAO J L,CHEN X D. Extreme ultraviolet lithography technology[J]. Chinese Science Bull.,1998,43(8):785-791.(in Chinese) [3] 窦银萍,孙长凯,林景全. 激光等离子体极紫外光刻光源[J]. 中国光学,2013,6(1):20-33. DOU Y P,SUN CH K,LIN J Q. Laser-produced plasma light source for extreme ultraviolet lithography[J]. Chinese Optics,2013,6(1):20-33.(in Chinese) [4] SONG I H,WATANABE M,HAYASHI Y,et al.. Experimental study of capillary Z-pinch discharge plasma for EUV lithography [C]//31^st EPS Conference on Plasma Phys,Jun 28-July 2,2004,London,UK,2004. [5] 程元丽,李思宁,王骐.激光等离子体和气体放电EUV光刻光源[J]. 激光技术,2004,28(6):561-564. CHENG Y L,LI S N,WANG Q. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. Laser Technology,2004,28(6):561-564.(in Chinese) [6] MATSUOKA Y,NAKAI Y,FUJIOKA S,et al.. Comparative and quantitative study of neutral debris emanated from tin plasmas produced by neodymium-doped yttrium-aluminum-garnet and carbon dioxide laser pulses[J]. Appl. Phys. Lett.,2010,97:111502 [7] TAO Y,TILLACK M S,SEQUOIA K L,et al.. Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a lon CO₂ laser pulse[J]. Appl. Phys. Lett..,2008,92:251501 [8] EUV radiation characteristics of a CO₂ laser produced Xe plasma[J]. Appl. Physics B,2006,83(2):213-218 [9] 吴伟伟,唐军,吴兆杰. 高能脉冲激光远场多参量测试系统设计[J]. 光学与光电技术,2011,9(1):9-12. WU W W,TANG J,WU ZH J. Design of far-field muti-parameters testing system for high-energy pulsed laser[J]. Opt. Optoelectronic Technol.,2011,9(1):9-12.(in Chinese) [10] 刘芳,徐嘉,张燕,等. 光学器件微振动引起的光束指向稳定性分析[J]. 光学学报,2011,31(11):1120001-7. LIU F,XU J,ZHANG Y,et al.. Analysis on beam directing stability problem caused by micro-vibration of optical components[J]. Acta Optica Sinc,2011,31(11):1120001-7.(in Chinese) [11] 王思雯,郭立红,赵帅,等. 高功率CO²激光对远场HgCdTe探测器的干扰实验[J]. 光学 精密工程,2010,18 (4):798-804. WANG S W,GUO L H,ZHAO SH,et al.. Experiments of high-power CO₂ laser disturbance to far-field HgCdTe detectors[J]. Opt. Precision Eng.,2010,18(4):798-804.(in Chinese) [12] LUBLINA L,WARKENTINA D,DAS P P,et al.. High-performance beam stabilization for next-generation arf beam delivery systems[J]. SPIE,2003,5040:1682-1693. [13] FUJIMOTO J,OHTA T,NOWAK K M,et al.. Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source[J]. SPIE,2011,7969:79692S.