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极紫外多层膜技术研究进展

张立超

张立超. 极紫外多层膜技术研究进展[J]. 中国光学(中英文), 2010, 3(6): 554-565.
引用本文: 张立超. 极紫外多层膜技术研究进展[J]. 中国光学(中英文), 2010, 3(6): 554-565.
ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.
Citation: ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.

极紫外多层膜技术研究进展

详细信息
    作者简介:

    张立超 (1979—),男,吉林人,博士,副研究员,主要从事短波光学薄膜技术方面的研究。 E-mail:lichaod@yahoo.com.cn

  • 中图分类号: O484

Progress in EUV multilayer coating technologies

  • 摘要: 在极紫外波段,任何材料都表现出极强的吸收特性,因此,采用多层膜实现高反射率是构建正入射式光学系统的唯一途径。本文总结了极紫外多层膜的发展进程,叙述了制备极紫外多层膜的关键技术(磁控溅射、电子束蒸发、离子束溅射)以及它们涉及的相关设备。由于多层膜反射式光学元件主要应用于极紫外光刻与极紫外天文观测,文中重点讨论了极紫外光刻系统对多层膜性能的要求,镀膜过程中的面形精度和热稳定性等问题;同时介绍了极紫外天文观测中使用的多层膜的特点,特别讨论了多层膜光栅的制备技术和亟待解决的问题。

     

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  • 收稿日期:  2010-06-11
  • 修回日期:  2010-08-13
  • 刊出日期:  2010-12-20

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