Volume 4 Issue 2
Apr.  2011
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LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.
Citation: LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.

Progress in grating parameter measurement technology

  • Received Date: 13 Jan 2011
  • Rev Recd Date: 14 Mar 2011
  • Publish Date: 25 Apr 2011
  • Grating parameter measurement technology is a key evaluation criterion of grating fabrication. This paper introduces several kinds of grating measuring methods that have been relative mature in present. It focuses on the Atomic Force Microscopy(AFM) method, Scanning Electron Microscopy(SEM), Laser Diffraction(LD) method and scattering measuring method(ellipsometry), and describes their working principles, developing trends and their own advantages and disadvantages. It points out that the AFM and SEM methods can measure the local profile of a grating and can get its surface profile defect. The LD method and scattering method can reflect average results of a laser radiation region, in which the LD method can give the grating period parameters and the ellipsometry can offer the other parameters except the period parameters. Furthermore, the grating parameters gotten by these method are identical, and the LD method provides a minimum uncertainty, the AMF method comes second and the SEM is the last one. In the end, it discusses the developing directions of grating parameter measurement technologies.

     

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