Volume 3 Issue 6
Dec.  2010
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DENG Wen-yuan, LI Chun, JIN Chun-shui. Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering[J]. Chinese Optics, 2010, 3(6): 630-636.
Citation: DENG Wen-yuan, LI Chun, JIN Chun-shui. Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering[J]. Chinese Optics, 2010, 3(6): 630-636.

Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering

  • Received Date: 12 Jul 2010
  • Rev Recd Date: 14 Sep 2010
  • Publish Date: 20 Dec 2010
  • HfO2 thin film is one of the most important films for optical applications in ultraviolet optics. As different fabrication methods will result in the different properties, it is essential to choose appropriate fabrication methods for practical applications. In this paper, HfO2 thin film for ultraviolet optics was fabricated by e-beam evaporation and ion beam sputtering, respectively. The material and optical properties of HfO2 thin film were measured and compared. The refractive index n and extinction coefficients k of HfO2 thin films were obtained by numerically fitting the measured transmittance and reflectance curves in the wavelength of 230-800 nm. Obtained results indicate that both the extinction coefficients from e-beam evaporation and ion beam sputtering are less than 210-3. On the basis of above works, two kinds of typical ultraviolet optics, violet low pass filter and 240 nm high reflector, were fabricated by e-beam evaporation and ion beam sputtering, respectively, and both of the devices have high spectral properties.

     

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