极紫外光刻系统物镜光学元件的支撑与分析

王辉

Volume 3 Issue 6

Dec. 2010

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Chinese Optics > 2010 > 3(6): 598-604.

WANG Hui. Objective optical mounts and analysis for EUVL[J]. Chinese Optics, 2010, 3(6): 598-604.

Citation:

WANG Hui. Objective optical mounts and analysis for EUVL[J]. Chinese Optics, 2010, 3(6): 598-604.

WANG Hui. Objective optical mounts and analysis for EUVL[J]. Chinese Optics, 2010, 3(6): 598-604.

Citation:

WANG Hui. Objective optical mounts and analysis for EUVL[J]. Chinese Optics, 2010, 3(6): 598-604.

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Objective optical mounts and analysis for EUVL

WANG Hui

Changchun Institute of Optics,Fine Mechanics and Physics, Chinese Academy of Sciences,Changchun 130033,China

Received Date: 11 May 2010
Rev Recd Date: 13 Jul 2010
Publish Date: 20 Dec 2010

Abstract

Abstract

The principle and requirements of the optical mount of an Extreme Ultraviolet Lithography(EUVL) system are introduced, and the mount structures according with the kinematic coupling requirements used in an actual lithographic camera and used in an interferometer are analyzed. The mount performance and key problems in mount precept are studied, and the corresponding solutions are also brought forward. Finally, Finite Element Analysis(FEA) models for optical mounts are built up, and the figure changes in the gravitation field and thermal field are analyzed, respectively. The results indicate that the figures on the mount structures used in the camera and used in the interferometer are the same basically in gravitational field, and the difference of the figure is 0.002 6 nm(RMS). When the temperature has a change of 0.05 ℃, the figure change of the structure is in the scale of 0.001 nm(RMS). The results show that the proposed kinematic mount structures can satisfy the mechanical requirements of mounts for EUVL systems.
- Extreme Ultraviolet Lithography(EUVL),
- objective,
- kinematic mount,
- Finite Element Analysis(FEA)

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References

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