Volume 3 Issue 6
Dec.  2010
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ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.
Citation: ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.

Progress in EUV multilayer coating technologies

  • Received Date: 11 Jun 2010
  • Rev Recd Date: 13 Aug 2010
  • Publish Date: 20 Dec 2010
  • All materials have strong absorptin properties in Extreme Ultra Violet(EUV) region. Therefore, it is an only approach to construct a normal incidence optical system by using multilayer coatings to improve its reflectivity. In this paper, the development of EUV multilayer coatings is introduced and the key technologies for fabricating multilayer coatings(magnetron sputtering, electron beam evaporating, ion beam sputtering) and their relative apparatus are described. As multilayer coating reflective optical elements are mainly used in the EUV lithography and EUV astrophysics, it lays the emphasis on the study on the characteristics of multilayer coatings in EUV lithographic equipment, and the surface accuracy and thermal stability in coating processing. Furthermore, it also gives the special multilayer coatings for astronomical observations and discusses the fabrication of multilayer coating gratings and several problems to be solved.

     

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