离子束溅射制备GdF<sub>3</sub>光学薄膜沉积速率分布特性

贺健康; 张立超; 才玺坤; 时光; 武潇野; 梅林

doi:10.3788/CO.20160903.0356

Volume 9 Issue 3

May 2016

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Article Contents

Chinese Optics > 2016 > 9(3): 356-363.

HE Jian-kang, ZHANG Li-chao, CAI Xi-kun, SHI Guang, WU Xiao-ye, MEI Lin. Deposition rate distribution of GdF3 optical coating prepared by ion beam sputtering[J]. Chinese Optics, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356

Citation:

HE Jian-kang, ZHANG Li-chao, CAI Xi-kun, SHI Guang, WU Xiao-ye, MEI Lin. Deposition rate distribution of GdF₃ optical coating prepared by ion beam sputtering[J]. Chinese Optics, 2016, 9(3): 356-363. doi: 10.3788/CO.20160903.0356

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Deposition rate distribution of GdF₃ optical coating prepared by ion beam sputtering

doi: 10.3788/CO.20160903.0356

Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

Funds:

Supported by National Science and Technology Major Project of China No.2009ZX02205

Received Date: 29 Jan 2016
Rev Recd Date: 23 Feb 2016
Publish Date: 25 Jan 2016

Abstract

Abstract

The deposition rate distribution of single GdF₃ layer deposited by ion beam sputtering(IBS) has been investigated in this paper. First, Two dimension deposition rate distribution of GdF₃ thin films are measured by an UV-film thickness measuring instrument, and the expression of two dimension deposition rate distribution are obtained by using fitting models. Second, the influence of beam current, beam voltage and the angle of target on deposition rate distribution feature is analyzed. Finally, the experiments of thickness uniformity have been carried out using designed mask, based on the expression of two dimension deposition rate. Experimental results indicate that the deposition rate in horizontal direction is satisfied with the ECS function. And in vertical direction it is satisfied with standard Gauss function. The residual error of fitting expression is 2.05×10^-6. The feature of deposition rate distribution remains the same when the beam current and beam voltage are changed. With the increase of the target angle, the value of peak width at half height of Gauss function are increased. The peak position is changing, and the maximum of deposition rate can be reached when the target angle is 292°. The thickness uniformity is adjusted to 97.9% for a plane element with radius of 270 mm by using mask.
- ion beam sputtering,
- optical coating,
- deposition rate,
- two dimension fitting,
- coating thickness uniformity

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References(17)

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