Volume 8 Issue 2
Apr.  2015
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ZHANG Li-chao, CAI Xi-kun, SHI Guang. Optical coatings for DUV Lithography[J]. Chinese Optics, 2015, 8(2): 169-181. doi: 10.3788/CO.20150802.0169
Citation: ZHANG Li-chao, CAI Xi-kun, SHI Guang. Optical coatings for DUV Lithography[J]. Chinese Optics, 2015, 8(2): 169-181. doi: 10.3788/CO.20150802.0169

Optical coatings for DUV Lithography

doi: 10.3788/CO.20150802.0169
  • Received Date: 21 Nov 2014
  • Accepted Date: 13 Feb 2015
  • Publish Date: 25 Apr 2015
  • Deep-ultraviolet(DUV) is the shortest wavelength of conventional optical techniques. With the wavelength shrinks, DUV optical coatings are confronted with a series of technical problems. As a kind of typical ultra precision optical system, DUV lithography system proposes stringent requirements on DUV coating optics. In this paper, coating materials and the coating design procedures of DUV coatings are summarized. Then, key problems on the guarantee of optical properties are discussed such as coating deposition techniques, surface figure preservation of coated optics, coating thickness distribution correction of large curved surfaces. Finally, detailed analysis for the environmental adaptability of DUV coatings are made to critical factors such as the environmental contaminations and the laser irritation characters. The above analysis points out directions to breakthrough bottlenecks on the development of DUV lithograph coatings and meet the requirements of ultra-precision DUV optical systems.

     

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