热蒸发与离子束溅射制备LaF<sub>3</sub>薄膜的光学特性

才玺坤; 张立超; 梅林; 时光

doi:10.3788/CO.20140705.0808

Volume 7 Issue 5

Sep. 2014

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Chinese Optics > 2014 > 7(5): 808-815.

CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics, 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808

Citation:

CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF₃ thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics, 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808

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Optical properties of LaF₃ thin films prepared by thermal evaporation and ion beam sputtering

doi: 10.3788/CO.20140705.0808

State Key Laboratory of Applied Optics, Chaugchuu lustatute of Optics, Fame Mechauacs and Physics Chaua Academy of Sciences, Chaugchuu 130033, China

Received Date: 15 Apr 2014
Rev Recd Date: 18 Jul 2014
Publish Date: 25 Sep 2014

Abstract

Abstract

To meet the requirements for different practical applications, we investigate the properties of single LaF3 layer deposited by resistive heating Mo-boat(RH) and ion beam sputtering(IBS) in this paper. First, transmittance and reflectance spectra of LaF3 thin films were measured by an UV-visible spectrophotometer, and the refractive indexes and extinction coefficients were obtained by using different models. Second, stress-temperature curves of LaF3 thin films during heating and cooling cycles were carried out by a stress measurement system. Finally, the X-ray diffraction(XRD) was used to characterize the microstructure of LaF3 layers. Experimental results indicate that LaF3 thin film fabricated by thermal evaporation(RH LaF3) had an inhomogeneous refractive index; the refractive index and extinction coefficient at 193 nm are 1.687 and 510-4 for RH LaF3, and 1.714 and 910-4for IBS LaF3, respectively. RH LaF3 and IBS LaF3 exhibited inverse stress status. RH LaF3 had a tensile stress and IBS LaF3 showed a compressive stress, which decreased after annealing. The transmittances are 99.4% and 99.2% for RH deposited MgF2/LaF3 AR coating and IBS deposited AlF3/LaF3 AR coating, and the corresponding measured reflectances are 0.04% and 0.1%,respectively.
- thin films,
- LaF3,
- thermal evaporation,
- ion beam sputtering,
- stress,
- AR

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References(1)

References

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