Volume 6 Issue 4
Aug.  2013
Turn off MathJax
Article Contents
JIANG Zhen-hua, WANG Ting-feng, GUO Jin. Monitoring and controlling system for high power CO2 laser in 'LPP-EUV' light source[J]. Chinese Optics, 2013, 6(4): 544-550. doi: 10.3788/CO.20130604.0544
Citation: JIANG Zhen-hua, WANG Ting-feng, GUO Jin. Monitoring and controlling system for high power CO2 laser in "LPP-EUV" light source[J]. Chinese Optics, 2013, 6(4): 544-550. doi: 10.3788/CO.20130604.0544

Monitoring and controlling system for high power CO2 laser in "LPP-EUV" light source

doi: 10.3788/CO.20130604.0544
  • Received Date: 11 Apr 2013
  • Rev Recd Date: 17 Jun 2013
  • Publish Date: 10 Aug 2013
  • To meet the high stability requirements of the extreme ultraviolet(EUV) light source driven by a CO2 laser under the Laser Produced Plasma(LPP) system, the simplified CO2 laser transmission system model is established. The monitoring and controlling methods of the beam power, pointing and the location are studied theoretically and experimentally based on the requirements of the beam stability. The beam monitoring and controlling experimental system is set up in a laboratory according to the characteristics of the high-power CO2 laser transmission system. The system includes a beam power control module, a beam pointing control module and a beam parameter monitoring module. The beam parameter monitoring module can accomplish the real-time measurements of beam powers, pointing, sizes and divergence angles and other important parameters. The simulation and experimental results show that the beam power control module can control the linearly polarized laser power from 1% to 100% and the beam pointing control module can control the beam pointing stability to be less than 10 rad, which meets the high stability requirements of the extreme ultraviolet(EUV) lithography for the CO2 laser source under the Laser Produced Plasma(LPP) system.

     

  • loading
  • [1] 谢常青,叶甜春. 极端远紫外光刻技术[J]. 半导体情报,2011,38(5):28-32. XIE C Q,YE T CH. Extreme ultraviolet lithography technology[J]. Semiconductor Information,2011,38(5):28-32.(in Chinese) [2] 王占山,曹建林,陈星旦. 极紫外投影光刻技术[J]. 科学通报,1998,43(8):785-791. WANG Z SH,CAO J L,CHEN X D. Extreme ultraviolet lithography technology[J]. Chinese Science Bull.,1998,43(8):785-791.(in Chinese) [3] 窦银萍,孙长凯,林景全. 激光等离子体极紫外光刻光源[J]. 中国光学,2013,6(1):20-33. DOU Y P,SUN CH K,LIN J Q. Laser-produced plasma light source for extreme ultraviolet lithography[J]. Chinese Optics,2013,6(1):20-33.(in Chinese) [4] SONG I H,WATANABE M,HAYASHI Y,et al.. Experimental study of capillary Z-pinch discharge plasma for EUV lithography [C]//31st EPS Conference on Plasma Phys,Jun 28-July 2,2004,London,UK,2004. [5] 程元丽,李思宁,王骐.激光等离子体和气体放电EUV光刻光源[J]. 激光技术,2004,28(6):561-564. CHENG Y L,LI S N,WANG Q. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. Laser Technology,2004,28(6):561-564.(in Chinese) [6] MATSUOKA Y,NAKAI Y,FUJIOKA S,et al.. Comparative and quantitative study of neutral debris emanated from tin plasmas produced by neodymium-doped yttrium-aluminum-garnet and carbon dioxide laser pulses[J]. Appl. Phys. Lett.,2010,97:111502 [7] TAO Y,TILLACK M S,SEQUOIA K L,et al.. Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a lon CO2 laser pulse[J]. Appl. Phys. Lett..,2008,92:251501 [8] EUV radiation characteristics of a CO2 laser produced Xe plasma[J]. Appl. Physics B,2006,83(2):213-218 [9] 吴伟伟,唐军,吴兆杰. 高能脉冲激光远场多参量测试系统设计[J]. 光学与光电技术,2011,9(1):9-12. WU W W,TANG J,WU ZH J. Design of far-field muti-parameters testing system for high-energy pulsed laser[J]. Opt. Optoelectronic Technol.,2011,9(1):9-12.(in Chinese) [10] 刘芳,徐嘉,张燕,等. 光学器件微振动引起的光束指向稳定性分析[J]. 光学学报,2011,31(11):1120001-7. LIU F,XU J,ZHANG Y,et al.. Analysis on beam directing stability problem caused by micro-vibration of optical components[J]. Acta Optica Sinc,2011,31(11):1120001-7.(in Chinese) [11] 王思雯,郭立红,赵帅,等. 高功率CO2激光对远场HgCdTe探测器的干扰实验[J]. 光学 精密工程,2010,18 (4):798-804. WANG S W,GUO L H,ZHAO SH,et al.. Experiments of high-power CO2 laser disturbance to far-field HgCdTe detectors[J]. Opt. Precision Eng.,2010,18(4):798-804.(in Chinese) [12] LUBLINA L,WARKENTINA D,DAS P P,et al.. High-performance beam stabilization for next-generation arf beam delivery systems[J]. SPIE,2003,5040:1682-1693. [13] FUJIMOTO J,OHTA T,NOWAK K M,et al.. Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source[J]. SPIE,2011,7969:79692S.
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索
    Article views(2393) PDF downloads(770) Cited by()
    Proportional views

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return