Volume 5 Issue 4
Aug.  2012
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SUN Zhen, GONG Yan. Design and analysis of iris diaphragm structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(4): 401-406. doi: 10.3788/CO.20120504.0401
Citation: SUN Zhen, GONG Yan. Design and analysis of iris diaphragm structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(4): 401-406. doi: 10.3788/CO.20120504.0401

Design and analysis of iris diaphragm structure in lithographic projection objective

doi: 10.3788/CO.20120504.0401
  • Received Date: 21 Mar 2012
  • Rev Recd Date: 23 May 2012
  • Publish Date: 10 Aug 2012
  • The diaphragm structure in a lithographic projection objective is designed depending on the character demand for large adjustable ranges, small installing spaces and high adjustable precision, and the iris diaphragm has an aperture of 236 mm and adjustable precision of NA?0.003. The parameters of the iris piece are calculated in detail and the size of part is acquired. Then, the part of gear is used to reduce the mass and motion friction of the motion structure and the strength of parts such as the rivet and gears is checked to ensure the adjustable precision and material stress of the diaphragm. It is shown that the stress of all of key parts of the diaphragm meets the requirement of the system and the nature frequency of the diaphragm is no dense frequency phenomenon. These results prove the rationality of the proposed structure.

     

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