Volume 5 Issue 4
Aug.  2012
Turn off MathJax
Article Contents
SUN Zhen, GONG Yan. Design and analysis of iris diaphragm structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(4): 401-406. doi: 10.3788/CO.20120504.0401
Citation: SUN Zhen, GONG Yan. Design and analysis of iris diaphragm structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(4): 401-406. doi: 10.3788/CO.20120504.0401

Design and analysis of iris diaphragm structure in lithographic projection objective

doi: 10.3788/CO.20120504.0401
  • Received Date: 21 Mar 2012
  • Rev Recd Date: 23 May 2012
  • Publish Date: 10 Aug 2012
  • The diaphragm structure in a lithographic projection objective is designed depending on the character demand for large adjustable ranges, small installing spaces and high adjustable precision, and the iris diaphragm has an aperture of 236 mm and adjustable precision of NA?0.003. The parameters of the iris piece are calculated in detail and the size of part is acquired. Then, the part of gear is used to reduce the mass and motion friction of the motion structure and the strength of parts such as the rivet and gears is checked to ensure the adjustable precision and material stress of the diaphragm. It is shown that the stress of all of key parts of the diaphragm meets the requirement of the system and the nature frequency of the diaphragm is no dense frequency phenomenon. These results prove the rationality of the proposed structure.

     

  • loading
  • [1] 董莉莉,金宏. 采用可变光阑的自动调光系统的稳定性分析[J]. 光学 精密工程 ,1999,7(1):100-104. DONG L L,JIN H. The stabilization analysis of automatically adjustable optical-intensity system using iris diaphragm[J]. Opt. Precision Eng.,1999,7(1):100-104.(in Chinese) [2] 李为,李德熊,陈南光.摄影仪器[M]. 北京:北京理工大学出版社,1993. LI W,LI D X,CHEN N G. Photography Apparatus[M]. Beijing:Beijing University of Technology,1993.(in Chinese) [3] 王义龙. 特殊口径调光系统的研制及其实验研究 .哈尔滨:哈尔滨工业大学,2007. WANG Y L. Development of the special caliber dimming system and its experimental study . Harbin:Graduate Harbin Institute of Technology,2007.(in Chinese) [4] 巩岩,张巍. 光刻曝光系统的现状与发展[J]. 中国光学与应用光学 ,2008,1(1):25-35. GONG Y,ZHANG W. Present status and progress in 193 nm exposure system in lithography[J]. Chinese J. Opt. Appl. Opt.,2008,1(1):25-35.(in Chinese) [5] 王丽萍. 极紫外投影光刻光学系统[J]. 中国光学与应用光学 ,2010,3(5):452-461. WANG L P. Optical system of extreme ultraviolet lithography[J]. Chinese J. Opt. Appl. Opt.,2010,3(5):452-461.(in Chinese) [6] 《光学仪器设计手册》编辑组.光学仪器设计手册[M]. 北京:国防工业出版社,1972. Editor group of 《Optics Apparatus Design Manual》. Optics Apparatus Design Manual[M]. Beijing:National Defence Industry Press,1972.(in Chinese) [7] 常远,甄万才. 齿轮传动与蜗轮蜗杆传动性能比较与消隙机构[J]. 电子工业专用设备 ,2007,(144):74-76. CHANG Y,ZHEN W C. Gear and worm-wheel steering gear's performances comparison and backlash eliminated structure[J]. Equipment Electronic Products Manufacturing,2007,(144):74-76.(in Chinese) [8] 程文冬,曹岩. 直齿轮啮合疲劳强度的有限元仿真与失效分析[J]. 西安工业大学学报 ,2010,30(3):239-242. CHENG W D,CAO Y. Simulation study of meshing fatigue strength of involute cylinder gear[J]. J. Xi'an Technological University,2010,30(3):239-242.(in Chinese)
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索
    Article views(3828) PDF downloads(981) Cited by()
    Proportional views

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return