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光栅参数测量技术研究进展

刘洪兴 张巍 巩岩

刘洪兴, 张巍, 巩岩. 光栅参数测量技术研究进展[J]. 中国光学(中英文), 2011, 4(2): 103-110.
引用本文: 刘洪兴, 张巍, 巩岩. 光栅参数测量技术研究进展[J]. 中国光学(中英文), 2011, 4(2): 103-110.
LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.
Citation: LIU Hong-xing, ZHANG Wei, GONG Yan. Progress in grating parameter measurement technology[J]. Chinese Optics, 2011, 4(2): 103-110.

光栅参数测量技术研究进展

基金项目: 

国家863高技术研究发展计划资助项目(No.863-2-5-1-13B)

详细信息
    作者简介:

    刘洪兴(1986—),男,山东聊城人,博士研究生,主要从事精密检测技术和辐射定标方面的研究。 E-mail:lhxing_888@126.com

  • 中图分类号: O436.1

Progress in grating parameter measurement technology

  • 摘要: 光栅参数测量技术是衡量光栅制作水平的重要标准。本文从直接测量法和间接测量法两个角度对现阶段较成熟的光栅参数测量技术进行了研究。重点介绍了原子力显微镜(AFM)测量法、扫描电子显微镜(SEM)测量法、激光衍射(LD)测量法以及散射测量术的测量原理和研究进展,指出了这些方法各自的优缺点和适用范围。AFM测量法和SEM测量法均可测得光栅的局部形貌信息,可用于检测光栅表面形貌缺陷;LD测量法和散射测量术反映的是激光照射区域的平均结果,其中LD测量法能得到光栅周期参数,而椭偏测量术能得到光栅周期以外的其他形貌参数。这些方法测得的光栅参数结果比较吻合,其中LD测量法不确定度最小,AFM次之,SEM最大。文章最后对未来光栅参数测量技术的发展方向进行了论述。

     

  • [1] 祝绍箕,邹海兴,包学诚.衍射光栅[M]. 北京:机械工业出版社,1986. ZHU SH J,ZOU H X,BAO X CH. Diffracted Grating[M]. Beijing:China Machine Press,1986. (in Chinese) [2] 巴音贺希格,李燕,吴娜,等. 紫外平面刻划光栅杂散光数值分析及测试[J]. 光学 精密工程 ,2009,17(8):1783-1789. Bayanheshig,LI Y,WU N,et al.. Numerical analysis and measurement of stray light from UV ruled gratings[J]. Opt. Precision Eng.,2009,17(8):1783-1789. (in Chinese) [3] 卢向东. 椭偏法测量光栅参数的理论研究 . 成都:四川大学 ,2003. LU X D. Theoretical study of measuring grating parameters with ellipsmetry . Chengdu:Sichuan University,2003.(in Chinese) [4] PAN S P,CHEN CH J, CHANG L CH. 1-D pitch measurement by laser diffractometer and Atomic Force Microscope . International Symposium on Precision Mechanical Measurements,Hefei,China,11-16 Aug. 2002:5-059-5-063. [5] YAO B CH,PAN SH P,CHEN CH J,et al.. SEM 1-D grating measurement compare to AFM and laser diffractometer . International Symposium on Instrumentation Science and Technology,Hefei,China,11-16 Aug. 2002:2-034-2-037. [6] DONALD A CH,EGBERT B,DAVID L B,et al.. Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy[J]. SPIE,2008,6922,69223J. [7] MICHAEL R M,CHRISTOPHER J R,S SOHAIL H N,et al.. Subwavelength photoresist grating metrology using scatterometry[J]. SPIE,1995,2352:251-261. [8] MELI F,THALMANN R,BLATTNER P. High precision pitch calibration of gratings using laser diffractometry . Proc. of the 1st Int. Conf. on Precision Engineering and Nanotechnology,Bremen,May 1999,2:252-255. [9] EGBERT B,WINFRIED M,ALEXANDER D,et al.. Multi-wavelength VIS/UV optical diffractometer for high-accuracy calibration of nano-scale pitch standards[J]. Measurement Sci. and Technol.,2007,18:667-674. [10] JENNIFER E D,BUHR E,DIENER A,et al.. Report on an international comparison of one-dimensional(1D) grating pitch[J]. Metrologia,2009,46:04001. [11] 倪重文,陈宪锋,沈小明,等. 分光计测定光栅常数[J]. 大学物理实验 ,2008,22(2):50-53. NI ZH W,CHEN X F,SHEN X M,et al.. Discussion on the experiment of diffracive grating constant with spectrometer[J]. Physical Experiment College,2008,22(2):50-53.(in Chinese) [12] PETRE C L,JOHN R M,ADRIAN S,et al.. The characterization of grating using the optical scatteromter[J]. Romanian J. Physics,2010,55(3-4):376-385. [13] BABAR K M,STEPHEN A C,SOHAIL S,et al.. Ellipsometric scatterometry for the metrology of sub-0.1 μm-linewidth structures[J]. Appl. Opt.,1998,37(22):5112-5115. [14] NI X,JAKATDAR N,BAO J,et al.. Specular spectroscopic scatterometry in DUV lithography[J]. SPIE,1999,3667:159-168. [15] HSU-TING H,FRED L T. Erratum to 'Spectroscopic ellipsometry and reflectometry from gratings(Scatterometry) for critical dimension measurement and in situ, real-time process monitoring’[J]. Thin Solid Films,2004,468:339-346. [16] PETRE C L. Phase-modulation scatterometry[J]. Appl. Opt.,2002,41(34):7187-7192. [17] WEI SH M,LI L F. Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network[J]. Appl. Opt.,2008,47(13):2524-2532. [18] ANTOS R,OHLIDAL I,MISTRIK J,et al.. Spectroscopic ellipsometry on lamellar gratings[J]. Appl. Surface Sci.,2005,244:225-229. [19] 张丽娟,傅克祥,李建龙,等. 用透射光谱法测光栅参数的数值模拟[J]. 激光杂志 ,2005,26(3):42-44. ZHANG L J,FU K X,LI J L,et al.. The numerical simulation of measuring grating parameters with the transmission spectrum method[J]. Laser J.,2005,26(3):42-44.(in Chinese) [20] 张丽娟,傅克祥,麻建勇,等. 透射光谱法测光栅参数的可行性[J]. 激光技术 ,2005,29(2):165-168. ZHANG L J,FU K X,MA J Y,et al.. The feasibility of measuring grating parameters with the transmission spectrum method[J]. Laser Technol.,2005,29(2):165-168. (in Chinese) [21] 李健龙,傅克祥,朱建华,等. 用光栅正负一级能量比侧体积相位全息光栅参量[J]. 光子学报 ,2006,35(2):239-243. LI J L,FU K X,ZHU J H,et al.. Determining the parameters of VPHG with the diffractive efficiencies ratio (+1/-1)[J]. Acta Photonica Sinica,2006,35(2):239-243.(in Chinese) [22] 张丽娟,卢向东,欧伟英. 对正负一级能量比测量光栅参量方法的改进[J]. 光学学报 ,2006,26(11):1605-1608. ZHANG L J,LU X D, OU W Y. Improvement on measuring grating parameters with diffraction orders of m=±1 efficiencies ratio[J]. Acta Opt. Sinica,2006,26(11):1605-1608.(in Chinese) [23] 付赛,陈海清. 一种基于CCD的实时测量光栅常数的方法[J]. 应用光学 ,2005,26(1):53-55. FU S,CHEN H Q. A new method based on CCD to measure the constant of grating[J]. J. Appl. Opt.,2005,26(1):53-55.(in Chinese) [24] 李岩,花国梁.精密测量技术[M]. 北京:中国计量出版社,2001. LI Y , HUA G L. Precision Measurement Technology[M]. Beijing:China Metrology Press,2001.(in Chinese) [25] 谭鑫,李文昊,巴音贺希格,等. 紫外全息闪耀光栅的制作[J]. 光学 精密工程 ,2010,18(7):1536-1542. TAN X,LI W H,Bayanheshig,et al.. Fabrication of ultraviolet holographic blazed grating[J]. Opt. Precision Eng.,2010,18(7):1536-1542.(in Chinese) [26] 金伟华,金春水,张立超,等. 基于混合优化算法测定铝薄膜光学常数[J]. 光学 精密工程 ,2008,16(9):1582-1588. JIN W H,JIN C SH,ZHANG L CH,et al.. Determination of optical constants for aluminum thin film based on combined optimal algorism[J]. Opt. Precision Eng.,2008,16(9):1582-1588.(in Chinese)
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出版历程
  • 收稿日期:  2011-01-13
  • 修回日期:  2011-03-14
  • 刊出日期:  2011-04-25

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