留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

极紫外多层膜技术研究进展

张立超

张立超. 极紫外多层膜技术研究进展[J]. 中国光学, 2010, 3(6): 554-565.
引用本文: 张立超. 极紫外多层膜技术研究进展[J]. 中国光学, 2010, 3(6): 554-565.
ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.
Citation: ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.

极紫外多层膜技术研究进展

详细信息
    作者简介:

    张立超 (1979—),男,吉林人,博士,副研究员,主要从事短波光学薄膜技术方面的研究。 E-mail:lichaod@yahoo.com.cn

  • 中图分类号: O484

Progress in EUV multilayer coating technologies

  • 摘要: 在极紫外波段,任何材料都表现出极强的吸收特性,因此,采用多层膜实现高反射率是构建正入射式光学系统的唯一途径。本文总结了极紫外多层膜的发展进程,叙述了制备极紫外多层膜的关键技术(磁控溅射、电子束蒸发、离子束溅射)以及它们涉及的相关设备。由于多层膜反射式光学元件主要应用于极紫外光刻与极紫外天文观测,文中重点讨论了极紫外光刻系统对多层膜性能的要求,镀膜过程中的面形精度和热稳定性等问题;同时介绍了极紫外天文观测中使用的多层膜的特点,特别讨论了多层膜光栅的制备技术和亟待解决的问题。
  • [1] D.阿特伍德. 软X射线与极紫外辐射的原理和应用 [M]. 张杰 . 北京:科学出版社,2003. ATTWOOD D T. Soft X-ray and Extreme Ultraviolet Radiation:Principle and Applications[M]. ZHANG J. Beijing:Science Press,2003.(in Chinese) [2] SPILLER E. Soft X-ray Optics[M]. Bellingham:SPIE Optical Engineering Press,1994. [3] DUMOND J,YOUTZ J P. An X-ray method for determining rate of diffusion in solid state[J]. J. Appl. Phys.,1940,11(5):357-365. [4] SPILLER E. Low-loss reflection coatings using absorbing materials[J]. Appl. Phys. Lett.,1972,20(9):365-369. [5] BARBEE Jr T W. Sputtered layered synthetic microstructure(LSM) dispersion elements[J]. AIP Conf. Proc.,1981,75:131-145. [6] MONTCALM C,GRABNER R F,HUDYMA R M,et al.. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system[J]. Appl. Opt.,2002,41(16):3262-3269. [7] LOUIS E,van HATTUM E D,van der WESTERN S A,et al.. High reflectance multilayers for EUVL HVM-projection optics[J]. SPIE,2010,7636:76362T. [8] 陈波,尼启良,王君林. 软X射线-极紫外波段光学研究[J]. 光学 精密工程 ,2007,15(12):1862-1868. CHEN B,NI Q L,WANG J L. Soft X-ray and extreme ultraviolet optics in CIOMP[J]. Opt. Precision Eng.,2007,15(12):1862-1868(in Chinese). [9] 林炳. 软X射线多层膜膜厚分布均匀性控制研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. LIN B. Study on thickness distribution uniformity control of soft X-ray multilayer mirrors . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [10] 朱洪力. 极紫外/软X射线多层膜热稳定性研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2008. ZHU H L. Researches of thermal stability of the EUV/SXR multilayers . Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [11] 尼启良,刘世界,陈波. 小型高精度软X射线-极紫外反射率计[J]. 光学 精密工程 ,2008,16(10):1886-1890. NI Q L,LIU SH J,CHEN B. Compact high-precision soft X-ay and extreme ultraviolet reflectometer[J]. Opt. Precision Eng.,2008,16(10):1886-1890.(in Chinese) [12] 向鹏. 13 nm Mo/Si多层膜残余应力研究 . 长春:中国科学院长春光学精密机械与物理研究所 ,2002. XIANG P. Changchun:Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,2002.(in Chinese) [13] 秦俊岭,邵建达,易葵,等. Mo/Si软X射线多层膜的界面粗糙度研究[J]. 强激光与粒子束 ,2007,19(5):763-765. QIN J L,SHAO J D,YI K,et al.. Interface roughness of Mo/Si soft X-ray multilayer[J]. High Power Laser and Particle Beams,2007,19(5):763-765.(in Chinese) [14] 秦俊岭,邵建达,易葵,等. 研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟[J]. 光学学报 ,2007,36(2):300-303. QIN J L,SHAO J D,YI K,et al.. A simulation study of the influence of interdiffusion barrier on soft X-ray reflectivity of Mo/Si multilayers,Acta Opt. Sinica,2007,36(2):300-303.(in Chinese) [15] 秦俊岭,邵建达,易葵. 用不同的Mo靶溅射功率制备Mo/Si多层膜[J]. 强激光与粒子束 ,2007,19(1):67-69. QIN J L,SHAO J D,YI K. Mo/Si multilayers prepared with different sputtering power of Mo target[J]. High Power Laser and Particle Beams,2007,19(1):67-69.(in Chinese) [16] 朱京涛,黄秋实,白亮,等. 不同本底真空度下SiC/Mg极紫外多层膜的制备和测试[J]. 光学 精密工程 ,2009,17(12):2946-2951 ZHU J T,HUANG Q SH,BAI L,et al.. Manufacture and measurement of SiC/Mg EUV multilayer mirrors in different base pressures[J]. Opt. Precision Eng.,2009,17(12):2946-2951.(in Chinese) [17] 吴文娟. 极紫外和软X射线窄带多层膜的研究 . 上海:同济大学 ,2007. WU W J. The Study of extreme ultraviolet and soft X-ray narrowband multilayers . Shanghai:Tongji University,2007.(in Chinese) [18] 王洪昌. 极紫外与软X射线多层膜偏振元件研究 . 上海:同济大学 ,2007. WANG H CH. The research of multilayer polarizing components in extreme ultraviolet and soft X-ray . Shanghai:Tongji University,2007.(in Chinese) [19] KAISER N,YULIN S,PERSKE M,et al.. High-performance EUV multilayer optics[J]. SPIE,2008:71010Z. [20] SOUFLI R,SPILLER E,SCHMIDTA M A,et al.. Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution[J]. SPIE,2001,4343:51-59. [21] TAKAHARU M. Nikon EUVL development progress update . 2006 EUVL Symposium Proceedings,Nikon T.Miura,16 Oct,2006. [22] MIURA T,MURAKAMI K,SUZUKI K,et al.. Nikon EUVL development progress summary[J]. SPIE,2006,6151:615105. [23] JEON C,KEARNER P,MA A,et al.. Enabling defect-free masks for extreme ultraviolet lithography[J]. SPIE,2007,6533:653310. [24] YULIN S,FEIGL T,KUHLMANN T,et al.. Interlayer transition zones in Mo/Si superlattices[J]. J. Appl. Phys.,2002,92(3):1216-1220. [25] STEARNS D G,GAINS D P,SWEENEYS D W,et al.. Nonspecular X-ray scattering in a multilayer-coated imaging system[J]. J. Appl. Phys.,1998,84(2):1003-1028. [26] SCHRODER S,FEIGL T,DUPARRE A,et al.. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates[J]. Opt. Express,2007,15(20):13997-14012. [27] HENKE B L,GULLIKSON E M,DAVIS J C. X-ray interactions:photoabsorption, scattering, transmission and reflection at E=50~30,000 eV, Z=1-92[J]. Atomic. Data and Nucl. Table,1993,54:181-342. [28] ASCHENTRUP A,HACHMANN W,WESTERWALBESLOH,et al.. Determination of layer-thickness fluctuations in MoSi multilayers by cross-sectional HR-TEM and X-ray diffraction[J]. Appl. Phys. A.,2003,77:607-611. [29] YAKSHIN A E,Van de KRUIJS R W E,NEDELCU I,et al.. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition[J]. SPIE,2007,6517:65170L. [30] BAJT S,ALAMEDA J,BARBEE T,et al.. Improved reflectance and stability of Mo/Si multilayers[J]. SPIE,2001,4506:65-75. [31] BRAUN S,FOLTYN T,VAN LOYEN L,et al.. Multi-component EUV multilayer mirrors[J]. SPIE,2003,5037:274-285. [32] SPILLER E,BAKER S,PARRA E,et al.. Smoothing of mirror substrates by thin-flim deposition[J]. SPIE,1999,3767:143-153. [33] BAKSHI V. EUV Lithography[M]. Bellingham:SPIE Optical Engineering Press,2006. [34] SPILLER E. High performance multilayer coatings for EUV lithography[J]. SPIE,2004,5193:89-97. [35] FOLTA J A,BAJT S,BARBEE T W,et al.. Advances in multilayer reflective coatings for extreme-ultraviolet lithography[J]. SPIE,1999,3676:702-709. [36] SOUFLI R,HUDYMA R M,SPILLER E,et al.. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography[J]. Appl. Opt.,2007,41(16):3262-3269. [37] FREITAG J M,CLEMENS B M. Stress evolution in Mo/Si multilayers for high reflectivity extreme ultraviolet mirrors[J]. Appl. Phys. Lett.,1998,73:43-45. [38] TINONE M,HAGA T,KINOSHITA. Multilayer sputter deposition stress control[J]. Electron Spectro. Relat. Phenom.,1996,80:461-464. [39] SHIRAISHI M,ISHIYAMA W,OSHINO T,et al.. Low stress molybdenum/silicon multilayer coatings for extreme ultraviolet lithography[J]. Jpn. J. Appl. Phys.,2000,39:6810-6814. [40] SHIRAISHI M,KANDAKA N,MURAKAMI K. Low-stress and high-reflective molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography[J]. SPIE,2004,5374:104-111. [41] ZOETHOUT E,SIPOS G,van de KRUIJS R W E,et al.. Stress mitigation in Mo/Si multilayers for EUV lithography[J]. SPIE,2003,5037:872-878. [42] BENOIT N,YULIN S,FEIGL T,et al. EUV multilayer mirrors with enhanced stability. [J]. SPIE,2006,6317:63170K. [43] KAISER N,YULIN S,FEIGL T. Si-based multilayers with high thermal stability[J]. SPIE,2000,4146:91-100. [44] BAJT S,STEARNS D G. High-temperature stability multilayers for extreme-ultraviolet condenser optics[J]. Appl. Opt.,2005,44:7735-7743. [45] BENOIT N,YULIN S,FEIGL T,et al. High-temperature multilayers[J]. SPIE,2005,5751:1155-1161. [46] DOMINGO V. Soho,Yohkoh, Ulysses and trace:the four solar missions in perspective and available resources[J]. Astrophysics and Space Science,2002,282:171-188. [47] DEFISE J M,MOSES J D,CATURA R C,et al.. Calibration of EIT instrument for the SOHO mission[J]. SPIE,1995,2517:29-39. [48] SOUFLI R,WINDT D L,ROBINSON J C,et al. Development and testing of EUV multilayer coatings for the atomspheric imaging assembly instrument aboard the solar dynamics observatory[J]. SPIE,2005,5901:59010M. [49] WINDT D L,DONGUY S,SEELY J,et al.. Experimental comparison of extreme-ultraviolet multilayers for solar physics[J]. Appl. Opt.,2004,43(9):1835-1848. [50] KESKI-KUHA R A M. Layer synthetic microstructure technology considerations for the ectreme ultraviolet[J]. Appl. Opt.,1984,23(7):3534-3537. [51] BROSIUS J W,DAVILA J M,THOMAS R J. Solar active region and quiet-sun extreme-ultraviolet spectra from SERTS-95[J]. Astrophysical J. Suppl. Series,1998,119:225-276. [52] SEELY J F. Multilayer grating for the Extreme Ultraviolet Spectrometer(EUS)[J]. SPIE,2000,4138:174-181. [53] KOWALSKI M P,WOOD K S,BARSTOW M A,et al.. It's time for a new EUV orbital mission[J]. SPIE,2010,7732:77322E. [54] KOWALSKI M P,BERENDSE F B,BARBEE T W,et al.. The joint astrophysical plasmadynamic experiment(J-PEX) high-resolution EUV spectrometer diffraction grating efficiency[J]. SPIE,2006,41386266:62660W. [55] KOWALSKI M P,CRUDDACE R G,WOOD K S,et al.. Proposed multilayer-grating designs for the Astrophysical Plasmadynamic Explorer(APEX):an EUV high-resolution spectroscopic SMEX[J]. SPIE,2004,5168:21-30. [56] KOWALSKI M P,BARBEE Jr T W,CRUDDACE R G,et al.. Efficiency and long-term stability of a multilayer-coated, ion-etched blazed holographic gratings in the 125-133  wavelength region[J]. Appl. Opt.,1995,34:7338-7346. [57] SEELY J F,CRUDDACE R G,KOWALSKI M P,et al.. Polorization and efficiency of a concave multilayer grating in the 135-250- region and in normal-incidence and seya-namioka mounts[J]. Appl. Opt.,1995,34:7347-7354. [58] OSTERRIED K,HIDEMANN and NELLES B. Groove profile modification of blazed gratings by dip coating with hardenable liquids[J]. Appl. Opt.,1998,37(34):8002-8007. [59] HUI L,LIFENG L. Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask[J]. Appl. Opt.,2008,47:6212-6218. [60] HUI L,LICHAO Z,LIFENG L,et al.. High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region[J]. Opt. Lett.,2008,33(5):485-487. [61] KOWALSKI M P,SEELY J F,HUNTER W R,et al.. Dual waveband operation of a multilayer-coated diffraction grating in the soft X-ray range at near-normal incidence[J]. Appl. Opt.,1993,32:2422-2425. [62] LICHAO Z,HUI L,CHUNSHUI J,et al.. Broadband multilayer-coated normal incidence blazed grating with ~10% diffraction efficiency through the 13-16 nm wavelength region[J]. Opt. Lett.,2009,34(6):818-820.
  • [1] 宗楠, 胡蔚敏, 王志敏, 王小军, 张申金, 薄勇, 彭钦军, 许祖彦.  激光等离子体13.5 nm极紫外光刻光源进展 . 中国光学, 2020, 13(1): 28-42. doi: 10.3788/CO.20201301.0028
    [2] 曹佃生, 林冠宇, 杨小虎, 张子辉, 闻宝朋.  紫外双光栅光谱仪结构设计与波长精度分析 . 中国光学, 2018, 11(2): 219-230. doi: 10.3788/CO.20181102.0219
    [3] 才玺坤, 张立超, 时光, 贺健康, 武潇野, 梅林.  离子束溅射制备低应力深紫外光学薄膜 . 中国光学, 2016, 9(6): 649-655. doi: 10.3788/CO.20160906.0649
    [4] 孙梦至, 高劲松, 李资政, 杨海贵, 王笑夷.  基底温度对中阶梯光栅厚铝膜质量的影响 . 中国光学, 2016, 9(6): 656-662. doi: 10.3788/CO.20160906.0656
    [5] 尼启良.  使用曲面微通道板和感应电荷位置灵敏阳极的软X射线-极紫外光子计数成像探测器研究 . 中国光学, 2015, 8(5): 847-872. doi: 10.3788/CO.20150805.0847
    [6] 张立超, 才玺坤, 时光.  深紫外光刻光学薄膜 . 中国光学, 2015, 8(2): 169-181. doi: 10.3788/CO.20150802.0169
    [7] 张帆, 李秋顺, 姚卫国, 郑晖, 马耀宏, 董文飞.  覆膜长周期光纤光栅在生化分析中的应用及研究进展 . 中国光学, 2014, 7(1): 57-67. doi: 10.3788/CO.20140701.057
    [8] 王珣, 金春水, 匡尚奇, 喻波.  极紫外光学器件辐照污染检测技术 . 中国光学, 2014, 7(1): 79-88. doi: 10.3788/CO.20140701.079
    [9] 余华梁, 陈曦矅, 狄俊安.  自旋密度光栅和本征GaAs量子阱中的电子自旋双极扩散 . 中国光学, 2013, 6(5): 710-716. doi: 10.3788/CO.20130605.0710
    [10] 石进峰, 吴清文, 陈立恒, 杨献伟.  多层隔热材料飞行试验研究综述 . 中国光学, 2013, 6(4): 457-469. doi: 10.3788/CO.20130604.0457
    [11] 窦银萍, 孙长凯, 林景全.  激光等离子体极紫外光刻光源 . 中国光学, 2013, 6(1): 20-33. doi: 10.3788/CO.20130601.0020
    [12] 田亮, 王辉, 岳远斌, 陈长鸣, 张大明.  紫外固化型聚合物高阶布拉格波导光栅滤波器 . 中国光学, 2012, 5(6): 677-681. doi: 10.3788/CO.20120506.0677
    [13] 卜绍芳, 尼启良, 何玲平, 张宏吉, 刘世界.  极紫外波段微通道板光子计数探测器 . 中国光学, 2012, 5(3): 302-309. doi: 10.3788/CO.20120503.0302
    [14] 曲艺.  真空紫外波段光栅二级衍射效率测量装置 . 中国光学, 2010, 3(6): 566-571.
    [15] 邓文渊, 李春, 金春水.  电子束蒸发和离子束溅射HfO2紫外光学薄膜 . 中国光学, 2010, 3(6): 630-636.
    [16] 喻波.  Mo/Si多层膜小角X射线衍射结构表征 . 中国光学, 2010, 3(6): 623-629.
    [17] 王丽萍.  极紫外投影光刻光学系统 . 中国光学, 2010, 3(5): 452-461.
    [18] 王辉.  极紫外光刻系统物镜光学元件的支撑与分析 . 中国光学, 2010, 3(6): 598-604.
    [19] 王淑荣, 李福田, 曲艺.  空间紫外光学遥感技术与发展趋势 . 中国光学, 2009, 2(1): 17-22.
    [20] 尼启良, 刘世界, 陈 波.  极紫外位置灵敏阳极光子计数成像探测器研究 . 中国光学, 2009, 2(1): 36-40.
  • 加载中
计量
  • 文章访问数:  3255
  • HTML全文浏览量:  59
  • PDF下载量:  2181
  • 被引次数: 0
出版历程
  • 收稿日期:  2010-06-11
  • 修回日期:  2010-08-13
  • 刊出日期:  2010-12-20

极紫外多层膜技术研究进展

    作者简介:

    张立超 (1979—),男,吉林人,博士,副研究员,主要从事短波光学薄膜技术方面的研究。 E-mail:lichaod@yahoo.com.cn

  • 中图分类号: O484

摘要: 在极紫外波段,任何材料都表现出极强的吸收特性,因此,采用多层膜实现高反射率是构建正入射式光学系统的唯一途径。本文总结了极紫外多层膜的发展进程,叙述了制备极紫外多层膜的关键技术(磁控溅射、电子束蒸发、离子束溅射)以及它们涉及的相关设备。由于多层膜反射式光学元件主要应用于极紫外光刻与极紫外天文观测,文中重点讨论了极紫外光刻系统对多层膜性能的要求,镀膜过程中的面形精度和热稳定性等问题;同时介绍了极紫外天文观测中使用的多层膜的特点,特别讨论了多层膜光栅的制备技术和亟待解决的问题。

English Abstract

张立超. 极紫外多层膜技术研究进展[J]. 中国光学, 2010, 3(6): 554-565.
引用本文: 张立超. 极紫外多层膜技术研究进展[J]. 中国光学, 2010, 3(6): 554-565.
ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.
Citation: ZHANG Li-chao. Progress in EUV multilayer coating technologies[J]. Chinese Optics, 2010, 3(6): 554-565.
参考文献 (1)

目录

    /

    返回文章
    返回