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TiO2/Al2O3薄膜的原子层沉积和光学性能分析

卫耀伟 刘志超 陈松林

卫耀伟, 刘志超, 陈松林. TiO2/Al2O3薄膜的原子层沉积和光学性能分析[J]. 中国光学(中英文), 2011, 4(2): 188-195.
引用本文: 卫耀伟, 刘志超, 陈松林. TiO2/Al2O3薄膜的原子层沉积和光学性能分析[J]. 中国光学(中英文), 2011, 4(2): 188-195.
WEI Yao-wei, LIU Zhi-chao, CHEN Song-lin. Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions[J]. Chinese Optics, 2011, 4(2): 188-195.
Citation: WEI Yao-wei, LIU Zhi-chao, CHEN Song-lin. Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions[J]. Chinese Optics, 2011, 4(2): 188-195.

TiO2/Al2O3薄膜的原子层沉积和光学性能分析

详细信息
    作者简介:

    卫耀伟(1983—),男,河南洛阳人,硕士研究生,研究实习员,主要从事高功率激光薄膜研发方面的研究。 E-mail:weiyaowei2008@163.com

  • 中图分类号: O484.4

Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions

  • 摘要: 采用原子层沉积技术在熔石英和BK7玻璃基片上镀制了TiO2/Al2O3薄膜,沉积温度分别为110 ℃和280 ℃。利用X射线粉末衍射仪对膜层微观结构进行了分析研究,并在激光损伤平台上进行了抗激光损伤阈值测量。采用Nomarski微分干涉差显微镜和原子力显微镜对激光损伤后的形貌进行了观察分析。结果表明,采用原子层沉积技术镀制的TiO2/Al2O3增透膜的厚度均匀性较好,50 mm样品的膜层厚度均匀性优于99%;光谱增透效果显著,在1 064 nm处的透过率>99.8%;在熔石英和BK7基片上,TiO2/Al2O3薄膜在110 ℃时的激光损伤阈值分别为(6.730.47) J/cm2和(6.50.46) J/cm2,明显高于在280 ℃时的损伤阈值。

     

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出版历程
  • 收稿日期:  2010-11-25
  • 修回日期:  2011-01-13
  • 刊出日期:  2011-04-25

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